Hiroshi Matoba

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Osaka, JP

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Patents Grantslast 30 patents

Information Patent Grant
High-frequency power device and method for controlling high-frequen...
- Patent number 7,489,206
- Issue date Feb 10, 2009
- Daihen Corporation
- Hiroyuki Kotani
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma processing system
- Patent number 7,489,145
- Issue date Feb 10, 2009
- Daihen Corporation
- Hiroshi Matoba
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High-frequency power source
- Patent number 7,292,047
- Issue date Nov 6, 2007
- Daihen Corporation
- Ryohei Tanaka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Plasma processing system
- Publication number 20070152678
- Publication date Jul 5, 2007
- DAIHEN CORPORATION
- Hiroshi Matoba
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
High-frequency power device and method for controlling high-frequen...
- Publication number 20060220573
- Publication date Oct 5, 2006
- DAIHEN Corporation
- Hiroyuki Kotani
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
High-frequency power source
- Publication number 20060220656
- Publication date Oct 5, 2006
- DAIHEN CORPORATION
- Ryohei Tanaka
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Data-generating device and data-writing device for FPGA
- Publication number 20050069128
- Publication date Mar 31, 2005
- DAIHEN CORPORATION
- Takeshi Inoue
- G06 - COMPUTING CALCULATING COUNTING