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Hiroshi Moriuma
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Nara, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Amplification type positive resist composition
Patent number
7,135,268
Issue date
Nov 14, 2006
Sumitomo Chemical Company, Limited
Akira Kamabuchi
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Sulfonate and resist composition
Patent number
6,951,706
Issue date
Oct 4, 2005
Sumitomo Chemical Company, Limited
Satoshi Yamaguchi
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Chemical amplifying type positive resist composition
Patent number
6,835,527
Issue date
Dec 28, 2004
Sumitomo Chemical Company, Limited
Yoshiyuki Takata
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive resist composition
Patent number
6,815,140
Issue date
Nov 9, 2004
Sumitomo Chemical Company, Limited
Yasunori Uetani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically amplifying type positive resist composition
Patent number
6,767,686
Issue date
Jul 27, 2004
Sumitomo Chemical Company, Limited
Yasunori Uetani
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Resin composition for intermediate layer of three-layer resist
Patent number
6,743,885
Issue date
Jun 1, 2004
Sumitomo Chemical Company, Limited
Isao Yahagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive resist compositions comprising a hydroxyphenyl ketone
Patent number
6,274,287
Issue date
Aug 14, 2001
Sumitomo Chemical Company, Limited
Hiroshi Moriuma
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition
Patent number
6,068,962
Issue date
May 30, 2000
Sumitomo Chemical Company, Limited
Yasunori Uetani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working quinonediazide sulfonic acid ester resist composit...
Patent number
5,849,457
Issue date
Dec 15, 1998
Sumitomo Chemical Company, Limited
Katsuhiko Namba
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition
Patent number
5,468,590
Issue date
Nov 21, 1995
Sumitomo Chemical Company, Limited
Kazuhiko Hashimoto
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive resist composition
Patent number
5,451,484
Issue date
Sep 19, 1995
Sumitomo Chemical Company, Ltd.
Kyoko Nagase
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition
Patent number
5,429,904
Issue date
Jul 4, 1995
Sumitomo Chemical Company, Ltd.
Kyoko Nagase
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive type quinonediazide resist composition containing alkali-s...
Patent number
5,424,167
Issue date
Jun 13, 1995
Sumitomo Chemical Co., Ltd.
Yasunori Uetani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive positive resist composition comprising an alkal...
Patent number
5,407,780
Issue date
Apr 18, 1995
Sumitomo Chemical Company, Limited
Takeshi Hioki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive type resist composition
Patent number
5,326,665
Issue date
Jul 5, 1994
Sumitomo Chemical Company, Limited
Haruyoshi Osaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive radiation-sensitive resist composition
Patent number
5,275,910
Issue date
Jan 4, 1994
Sumitomo Chemical Company, Limited
Hiroshi Moriuma
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition containing 1,2-quinone diazide compound...
Patent number
5,188,920
Issue date
Feb 23, 1993
Sumitomo Chemical Company, Limited
Hiroshi Moriuma
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
Chemical amplification type positive resist composition
Publication number
20040191670
Publication date
Sep 30, 2004
Sumitomo Chemical Company, Limited
Nobuo Ando
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Sulfonate and resist composition
Publication number
20040152009
Publication date
Aug 5, 2004
Sumitomo Chemical Company, Limited
Satoshi Yamaguchi
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Amplification type positive resist composition
Publication number
20040029037
Publication date
Feb 12, 2004
Akira Kamabuchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist composition
Publication number
20030180659
Publication date
Sep 25, 2003
Yoshiyuki Takata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resin composition for intermediate layer of three-layer resist
Publication number
20030092854
Publication date
May 15, 2003
Sumitomo Chemical Company, Limited
Isao Yahagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Chemical amplifying type positive resist composition
Publication number
20030039918
Publication date
Feb 27, 2003
Yoshiyuki Takata
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
Chemically amplifying type positive resist composition
Publication number
20020146641
Publication date
Oct 10, 2002
Yasunori Uetani
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
POSITIVE RESIST COMPOSITION
Publication number
20020006574
Publication date
Jan 17, 2002
YASUNORI UETANI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist composition
Publication number
20010026905
Publication date
Oct 4, 2001
Sumitomo Chemical Company, Limited
Yasunori Uetani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY