Hiroshi Nagayasu

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Fukuoka-Ken, JP

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Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method, storage medium and substrate processin...
- Patent number 8,133,327
- Issue date Mar 13, 2012
- Tokyo Electron Limited
- Yoshichika Tokuno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,043,467
- Issue date Oct 25, 2011
- Tokyo Electron Limited
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-fluid nozzle for cleaning substrate and substrate cleaning appa...
- Patent number 8,037,891
- Issue date Oct 18, 2011
- Tokyo Electron Limited
- Itaru Kanno
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
Substrate cleaning method and substrate cleaning apparatus
- Publication number 20090050177
- Publication date Feb 26, 2009
- Hiroshi Nagayasu
- B08 - CLEANING
Information Patent Application
Substrate Processing Method, Storage Medium and Substrate Processin...
- Publication number 20090014033
- Publication date Jan 15, 2009
- Yoshichika Tokuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing apparatus and liquid processing method
- Publication number 20070231483
- Publication date Oct 4, 2007
- Hiromitsu Nanba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Two-fluid nozzle for cleaning substrate and substrate cleaning appa...
- Publication number 20070141849
- Publication date Jun 21, 2007
- TOKYO ELECTRON LIMITED
- Itaru Kanno
- B08 - CLEANING