Hiroshi Nakanishi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Methacrylic resin, method for producing methacrylic resin, shaped a...
- Patent number 11,072,673
- Issue date Jul 27, 2021
- MITSUBISHI CHEMICAL CORPORATION
- Takao Marutani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Glass substrate for mask blank
- Patent number 9,904,164
- Issue date Feb 27, 2018
- Asahi Glass Company, Limited
- Hiroshi Nakanishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, and process for its insp...
- Patent number 9,739,722
- Issue date Aug 22, 2017
- Asahi Glass Company, Limited
- Hiroshi Nakanishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical member base material for EUV lithography, and method for pr...
- Patent number 8,518,613
- Issue date Aug 27, 2013
- Asahi Glass Company, Limited
- Hiroshi Nakanishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Epoxy resin, epoxy resin composition thereof and cured product thereof
- Patent number 7,332,557
- Issue date Feb 19, 2008
- Tohto Kasei Co., Ltd.
- Shuya Shinohara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Image pickup optical system
- Patent number 6,278,554
- Issue date Aug 21, 2001
- Canon Kabushiki Kaisha
- Michiharu Aratani
- G02 - OPTICS
Information Patent Grant
Optical component, method of molding optical component, and mold fo...
- Patent number 6,144,505
- Issue date Nov 7, 2000
- Canon Kabushiki Kaisha
- Hiroshi Nakanishi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Optical element, method of molding the same, and laser scanning opt...
- Patent number 6,091,532
- Issue date Jul 18, 2000
- Canon Kabushiki Kaisha
- Hiroshi Nakanishi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Scanning lens system and optical scanning apparatus using the same
- Patent number 5,696,621
- Issue date Dec 9, 1997
- Canon Kabushiki Kaisha
- Hiroshi Nakanishi
- G02 - OPTICS
Information Patent Grant
Optical element molding method
- Patent number 5,549,855
- Issue date Aug 27, 1996
- Canon Kabushiki Kaisha
- Hiroshi Nakanishi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Plastic lens
- Patent number 5,408,360
- Issue date Apr 18, 1995
- Canon Kabushiki Kaisha
- Hiroshi Nakanishi
- G02 - OPTICS
Information Patent Grant
Plastic optical elements and a molding mold therefor
- Patent number 5,329,406
- Issue date Jul 12, 1994
- Canon Kabushiki Kaisha
- Hiroshi Nakanishi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Molding process and apparatus for transferring plural molds to plur...
- Patent number 5,075,051
- Issue date Dec 24, 1991
- Canon Kabushiki Kaisha
- Kazuhiko Ito
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
METHACRYLIC RESIN, METHOD FOR PRODUCING METHACRYLIC RESIN, SHAPED A...
- Publication number 20180201711
- Publication date Jul 19, 2018
- MITSUBISHI CHEMICAL CORPORATION
- Takao MARUTANI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
GLASS SUBSTRATE FOR MASK BLANK
- Publication number 20160223898
- Publication date Aug 4, 2016
- Asahi Glass Company, Limited
- Hiroshi NAKANISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS INSP...
- Publication number 20160109384
- Publication date Apr 21, 2016
- Asahi Glass Company, Limited
- Hiroshi NAKANISHI
- G01 - MEASURING TESTING
Information Patent Application
TiO2-CONTAINING QUARTZ-GLASS SUBSTRATE FOR AN IMPRINT MOLD AND MANU...
- Publication number 20150097304
- Publication date Apr 9, 2015
- Asahi Glass Company, Limited
- Akio KOIKE
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
TiO2-CONTAINING QUARTZ-GLASS SUBSTRATE FOR AN IMPRINT MOLD AND MANU...
- Publication number 20130149494
- Publication date Jun 13, 2013
- Asahi Glass Company, Limited
- Akio KOIKE
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
OPTICAL MEMBER BASE MATERIAL FOR EUV LITHOGRAPHY, AND METHOD FOR PR...
- Publication number 20130011773
- Publication date Jan 10, 2013
- ASAHI GLASS COMPANY, LIMITED
- Hiroshi NAKANISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Epoxy resin, epoxy resin composition thereof and cured product thereof
- Publication number 20040176563
- Publication date Sep 9, 2004
- Shuya Shinohara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hiroshi Nakanishi

Person

Patents Grantslast 30 patents

Methacrylic resin, method for producing methacrylic resin, shaped a...

Glass substrate for mask blank

Reflective mask blank for EUV lithography, and process for its insp...

Optical member base material for EUV lithography, and method for pr...

Epoxy resin, epoxy resin composition thereof and cured product thereof

Image pickup optical system

Optical component, method of molding optical component, and mold fo...

Optical element, method of molding the same, and laser scanning opt...

Scanning lens system and optical scanning apparatus using the same

Optical element molding method

Plastic lens

Plastic optical elements and a molding mold therefor

Molding process and apparatus for transferring plural molds to plur...

Patents Applicationslast 30 patents

METHACRYLIC RESIN, METHOD FOR PRODUCING METHACRYLIC RESIN, SHAPED A...

GLASS SUBSTRATE FOR MASK BLANK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS INSP...

TiO2-CONTAINING QUARTZ-GLASS SUBSTRATE FOR AN IMPRINT MOLD AND MANU...

TiO2-CONTAINING QUARTZ-GLASS SUBSTRATE FOR AN IMPRINT MOLD AND MANU...

OPTICAL MEMBER BASE MATERIAL FOR EUV LITHOGRAPHY, AND METHOD FOR PR...

Epoxy resin, epoxy resin composition thereof and cured product thereof