Hiroshi Nishimura

Person

Zama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam apparatus and method of manufacturing semiconductor d...
- Patent number 7,745,784
- Issue date Jun 29, 2010
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus and method of manufacturing semiconductor d...
- Patent number 7,247,848
- Issue date Jul 24, 2007
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Charged-particle-beam mapping projection-optical systems and method...
- Patent number 7,183,562
- Issue date Feb 27, 2007
- Nikon Corporation
- Hiroshi Nishimura
- G01 - MEASURING TESTING
Information Patent Grant
Charged-particle-beam mapping projection-optical systems and method...
- Patent number 7,064,339
- Issue date Jun 20, 2006
- Nikon Corporation
- Hiroshi Nishimura
- G01 - MEASURING TESTING
Information Patent Grant
Charged-particle-beam mapping projection-optical systems and method...
- Patent number 6,765,217
- Issue date Jul 20, 2004
- Nikon Corporation
- Hiroshi Nishimura
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for defect detection using charged particle beam
- Patent number 6,653,631
- Issue date Nov 25, 2003
- Nikon Corporation
- Hiroshi Nishimura
- G01 - MEASURING TESTING
Information Patent Grant
Electrostatic lens systems for secondary-electron mapping-projectio...
- Patent number 6,608,308
- Issue date Aug 19, 2003
- Nikon Corporation
- Toru Takagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus and method of manufacturing semiconductor d...
- Patent number 6,593,152
- Issue date Jul 15, 2003
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam type inspection device and method of making same
- Patent number 6,365,897
- Issue date Apr 2, 2002
- Nikon Corporation
- Muneki Hamashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable-magnification telecentric optical system
- Patent number 5,805,347
- Issue date Sep 8, 1998
- Nikon Corporation
- Hideo Mizutani
- G02 - OPTICS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,389,154
- Issue date Feb 14, 1995
- Nippon Telegraph & Telephone
- Nishimura Hiroshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave transforming method and plasma processing
- Patent number 5,003,152
- Issue date Mar 26, 1991
- Nippon Telegraph & Telephone Corporation
- Seitaro Matsuo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ON-BOARD EQUIPMENT CONTROL DEVICE AND ON-BOARD EQUIPMENT CONTROL ME...
- Publication number 20240022904
- Publication date Jan 18, 2024
- NISSAN MOTOR CO., LTD.
- Maiko KOMINE
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Electron beam apparatus and method of manufacturing semiconductor d...
- Publication number 20090050822
- Publication date Feb 26, 2009
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Charged-particle-beam mapping projection-optical systems and method...
- Publication number 20060192120
- Publication date Aug 31, 2006
- NIKON CORPORATION
- Hiroshi Nishimura
- G01 - MEASURING TESTING
Information Patent Application
Charged-particle-beam mapping projection-optical systems and method...
- Publication number 20040251428
- Publication date Dec 16, 2004
- NIKON CORPORATION
- Hiroshi Nishimura
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus and method of manufacturing semiconductor d...
- Publication number 20030207475
- Publication date Nov 6, 2003
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus and method of manufacturing semiconductor d...
- Publication number 20020142496
- Publication date Oct 3, 2002
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for defect detection using charged particle beam
- Publication number 20020005484
- Publication date Jan 17, 2002
- Nikon Corporation
- Hiroshi Nishimura
- G01 - MEASURING TESTING

Hiroshi Nishimura

Person

Patents Grantslast 30 patents

Electron beam apparatus and method of manufacturing semiconductor d...

Electron beam apparatus and method of manufacturing semiconductor d...

Charged-particle-beam mapping projection-optical systems and method...

Charged-particle-beam mapping projection-optical systems and method...

Charged-particle-beam mapping projection-optical systems and method...

Apparatus and method for defect detection using charged particle beam

Electrostatic lens systems for secondary-electron mapping-projectio...

Electron beam apparatus and method of manufacturing semiconductor d...

Electron beam type inspection device and method of making same

Variable-magnification telecentric optical system

Plasma processing apparatus

Microwave transforming method and plasma processing

Patents Applicationslast 30 patents

ON-BOARD EQUIPMENT CONTROL DEVICE AND ON-BOARD EQUIPMENT CONTROL ME...

Electron beam apparatus and method of manufacturing semiconductor d...

Charged-particle-beam mapping projection-optical systems and method...

Charged-particle-beam mapping projection-optical systems and method...

Electron beam apparatus and method of manufacturing semiconductor d...

Electron beam apparatus and method of manufacturing semiconductor d...

Apparatus and method for defect detection using charged particle beam