Hiroshi Oba

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Focused ion beam processing apparatus
- Patent number 11,721,517
- Issue date Aug 8, 2023
- Hitachi High-Tech Science Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite charged particle beam apparatus and control method thereof
- Patent number 11,017,982
- Issue date May 25, 2021
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,017,988
- Issue date May 25, 2021
- HITACH HIGH-TECH SCIENCE CORPORATION
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing emitter
- Patent number 10,658,143
- Issue date May 19, 2020
- Hitachi High-Tech Science Corporation
- Yoko Nakajima
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Focused ion beam apparatus
- Patent number 10,176,964
- Issue date Jan 8, 2019
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and plasma ignition method
- Patent number 10,056,232
- Issue date Aug 21, 2018
- Hitachi High-Tech Science Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 9,793,085
- Issue date Oct 17, 2017
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion source and charged particle beam apparatus
- Patent number 9,773,637
- Issue date Sep 26, 2017
- Hitachi High-Technologies Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion source and charged particle beam apparatus
- Patent number 9,773,646
- Issue date Sep 26, 2017
- Hitachi High-Technologies Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,773,634
- Issue date Sep 26, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Emitter structure, gas ion source and focused ion beam system
- Patent number 9,640,361
- Issue date May 2, 2017
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,583,299
- Issue date Feb 28, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus and control method thereof
- Patent number 9,418,817
- Issue date Aug 16, 2016
- Hitachi High-Tech Science Corporation
- Fumio Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repair apparatus
- Patent number 9,378,858
- Issue date Jun 28, 2016
- Hitachi High-Tech Science Corporation
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Emitter structure, gas ion source and focused ion beam system
- Patent number 9,129,771
- Issue date Sep 8, 2015
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam apparatus
- Patent number 9,111,717
- Issue date Aug 18, 2015
- Hitachi High-Tech Science Corporation
- Tatsuya Asahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus and method of adjusting ion beam optics
- Patent number 8,822,911
- Issue date Sep 2, 2014
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect repair apparatus and method for EUV mask using a hydrogen io...
- Patent number 8,460,842
- Issue date Jun 11, 2013
- SII NanoTechnology Inc.
- Takashi Ogawa
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
FOCUSED ION BEAM DEVICE
- Publication number 20240355574
- Publication date Oct 24, 2024
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Koji NAGAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM PROCESSING APPARATUS
- Publication number 20210296080
- Publication date Sep 23, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20200266029
- Publication date Aug 20, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20200135437
- Publication date Apr 30, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING EMITTER
- Publication number 20190267208
- Publication date Aug 29, 2019
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoko NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND PLASMA IGNITION METHOD
- Publication number 20170278678
- Publication date Sep 28, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20170148603
- Publication date May 25, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20170069456
- Publication date Mar 9, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20160322123
- Publication date Nov 3, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20160240346
- Publication date Aug 18, 2016
- Hitachi High-Technologies Corporation
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20160240354
- Publication date Aug 18, 2016
- Hitachi High-Technologies Corporation
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20160225574
- Publication date Aug 4, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM
- Publication number 20150357147
- Publication date Dec 10, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20150053866
- Publication date Feb 26, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20150047079
- Publication date Feb 12, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20140292189
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM
- Publication number 20140291542
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM APPARATUS
- Publication number 20130248732
- Publication date Sep 26, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tatsuya ASAHATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS AND METHOD OF ADJUSTING ION BEAM OPTICS
- Publication number 20130240720
- Publication date Sep 19, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect repair apparatus and method for EUV mask
- Publication number 20110189593
- Publication date Aug 4, 2011
- Takashi Ogawa
- B82 - NANO-TECHNOLOGY

Hiroshi Oba

Person

Patents Grantslast 30 patents

Focused ion beam processing apparatus

Composite charged particle beam apparatus and control method thereof

Charged particle beam apparatus

Method of manufacturing emitter

Focused ion beam apparatus

Charged particle beam apparatus and plasma ignition method

Focused ion beam apparatus

Plasma ion source and charged particle beam apparatus

Plasma ion source and charged particle beam apparatus

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Emitter structure, gas ion source and focused ion beam system

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Focused ion beam apparatus and control method thereof

Repair apparatus

Emitter structure, gas ion source and focused ion beam system

Ion beam apparatus

Focused ion beam apparatus and method of adjusting ion beam optics

Defect repair apparatus and method for EUV mask using a hydrogen io...

Patents Applicationslast 30 patents

FOCUSED ION BEAM DEVICE

FOCUSED ION BEAM PROCESSING APPARATUS

COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF

CHARGED PARTICLE BEAM APPARATUS

METHOD OF MANUFACTURING EMITTER

CHARGED PARTICLE BEAM APPARATUS AND PLASMA IGNITION METHOD

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

FOCUSED ION BEAM APPARATUS

Repair Apparatus

PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS

PLASMA ION SOURCE AND CHARGED PARTICLE BEAM APPARATUS

FOCUSED ION BEAM APPARATUS

EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM

Repair Apparatus

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM

ION BEAM APPARATUS

FOCUSED ION BEAM APPARATUS AND METHOD OF ADJUSTING ION BEAM OPTICS

Defect repair apparatus and method for EUV mask