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Hiroshi Saegusa
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Shizuoka, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
Patent number
9,152,048
Issue date
Oct 6, 2015
FUJIFILM Corporation
Hiroshi Saegusa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition for immersion exposure and pattern form...
Patent number
8,975,002
Issue date
Mar 10, 2015
FUJIFILM Corporation
Kei Yamamoto
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
Patent number
8,900,789
Issue date
Dec 2, 2014
FUJIFILM Corporation
Hiroshi Saegusa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
Patent number
8,802,349
Issue date
Aug 12, 2014
FUJIFILM Corporation
Masahiro Yoshidome
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
Patent number
8,795,944
Issue date
Aug 5, 2014
FUJIFILM Corporation
Hiroshi Saegusa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
Patent number
8,771,916
Issue date
Jul 8, 2014
FUJIFILM Corporation
Shuji Hirano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
Patent number
8,632,938
Issue date
Jan 21, 2014
FUJIFILM Corporation
Shinichi Sugiyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
Patent number
8,617,788
Issue date
Dec 31, 2013
FUJIFILM Corporation
Takayuki Kato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition for immersion exposure and pattern form...
Patent number
8,541,159
Issue date
Sep 24, 2013
FUJIFILM Corporation
Kei Yamamoto
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Polymerizable compound and polymer compound obtained by using the same
Patent number
8,362,170
Issue date
Jan 29, 2013
FUJIFILM Corporation
Shuji Hirano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Polymerizable compound and polymer compound obtained by using the same
Patent number
8,252,877
Issue date
Aug 28, 2012
FUJIFILM Corporation
Shuji Hirano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition, resin for use in the resist composition, compou...
Patent number
8,053,161
Issue date
Nov 8, 2011
FUJIFILM Corporation
Kenji Wada
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Fluorine-containing polymerizable monomer and polymer compound usin...
Patent number
7,932,348
Issue date
Apr 26, 2011
Central Glass Company, Limited
Hiroshi Saegusa
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Fluorine-containing polymerizable monomer and polymer compound usin...
Patent number
7,825,280
Issue date
Nov 2, 2010
Central Glass Company, Limited
Hiroshi Saegusa
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Photosensitive composition, compound for use in the photosensitive...
Patent number
7,799,505
Issue date
Sep 21, 2010
FUJIFILM Corporation
Kunihiko Kodama
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Fluorine-containing polymerizable monomer and polymer compound usin...
Patent number
7,728,103
Issue date
Jun 1, 2010
Central Glass Company, Limited
Hiroshi Saegusa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Fluorine-containing polymerizable monomer and polymer compound usin...
Patent number
7,629,434
Issue date
Dec 8, 2009
Central Glass Company, Limited
Hiroshi Saegusa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORM...
Publication number
20130337384
Publication date
Dec 19, 2013
FUJIFILM CORPORATION
Kei Yamamoto
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME
Publication number
20120271021
Publication date
Oct 25, 2012
FUJIFILM CORPORATION
Shuji HIRANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
Publication number
20120015301
Publication date
Jan 19, 2012
FUJIFILM CORPORATION
Masahiro Yoshidome
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
Publication number
20120009522
Publication date
Jan 12, 2012
FUJIFILM CORPORATION
Takayuki Kato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
Publication number
20110318687
Publication date
Dec 29, 2011
FUJIFILM CORPORATION
Hiroshi Saegusa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
Publication number
20110236828
Publication date
Sep 29, 2011
FUJIFILM Corporation
Shuji Hirano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORM...
Publication number
20110143280
Publication date
Jun 16, 2011
FUJIFILM CORPORATION
Kei Yamamoto
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
Publication number
20110091809
Publication date
Apr 21, 2011
FUJIFILM CORPORATION
Hiroshi Saegusa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
Publication number
20100248136
Publication date
Sep 30, 2010
FUJIFILM CORPORATION
Shinichi SUGIYAMA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Fluorine-Containing Polymerizable Monomer and Polymer Compound Usin...
Publication number
20100234556
Publication date
Sep 16, 2010
Central Glass Company, Limited
Hiroshi Saegusa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYMERIZABLE COMPOUND, LACTONE-CONTAINING COMPOUND, METHOD FOR MAN...
Publication number
20100152400
Publication date
Jun 17, 2010
FUJIFILM CORPORATION
Yusuke IIZUKA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME
Publication number
20100152401
Publication date
Jun 17, 2010
FUJIFILM CORPORATION
Shuji HIRANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
Publication number
20100015554
Publication date
Jan 21, 2010
FUJIFILM CORPORATION
Hiroshi Saegusa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Fluorine-Containing Polymerizable Monomer and Polymer Compound Usin...
Publication number
20090292104
Publication date
Nov 26, 2009
Central Glass Company, Limited
Hiroshi Saegusa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Fluorine-containing polymerizable monomer and polymer compound usin...
Publication number
20090023886
Publication date
Jan 22, 2009
Central Glass Company, Limited
Hiroshi Saegusa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE RESIST COMP...
Publication number
20080305429
Publication date
Dec 11, 2008
FUJIFILM CORPORATION
Hiroshi SAEGUSA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Fluorine-Containing Polymerizable Monomer and Polymer Compound Usin...
Publication number
20080234460
Publication date
Sep 25, 2008
Hiroshi Saegusa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE...
Publication number
20080138742
Publication date
Jun 12, 2008
FUJIFILM CORPORATION
Kunihiko KODAMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOU...
Publication number
20080081290
Publication date
Apr 3, 2008
FUJIFILM CORPORATION
Kenji Wada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY