Hiroshi Sanda

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Kanazawa Ishikawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Silicon carbide member for plasma processing apparatus
- Patent number 10,280,121
- Issue date May 7, 2019
- HOKURIKU SEIKEI INDUSTRIAL CO., LTD.
- Masahiro Okesaku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and semiconductor manufacturing apparatus
- Patent number 10,276,420
- Issue date Apr 30, 2019
- Kabushiki Kaisha Toshiba
- Shinya Ito
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20200118859
- Publication date Apr 16, 2020
- KABUSHIKI KAISHA TOSHIBA
- Hiroshi SANDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON CARBIDE MEMBER FOR PLASMA PROCESSING APPARATUS, AND PRODUCT...
- Publication number 20180072629
- Publication date Mar 15, 2018
- HOKURIKU SEIKEI INDUSTRIAL CO., LTD.
- Masahiro OKESAKU
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
ELECTROSTATIC CHUCK AND SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20180076080
- Publication date Mar 15, 2018
- Kabushiki Kaisha Toshiba
- Shinya ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VALVE AND SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20170067564
- Publication date Mar 9, 2017
- Kabushiki Kaisha Toshiba
- Eiichi Nagumo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS AND DEPOSITION METHOD
- Publication number 20160273110
- Publication date Sep 22, 2016
- Kabushiki Kaisha Toshiba
- Hiroshi Sanda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...