Hiroshi Shiho

Person

Chuo-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing pad
- Patent number D600989
- Issue date Sep 29, 2009
- JSR Corporation
- Hiroyuki Tano
- D08 - Tools and hardware
Information Patent Grant
Polishing pad
- Patent number D592030
- Issue date May 12, 2009
- JSR Corporation
- Hiroyuki Tano
- D08 - Tools and hardware
Information Patent Grant
Polishing pad
- Patent number D592029
- Issue date May 12, 2009
- JSR Corporation
- Hiroyuki Tano
- D08 - Tools and hardware
Information Patent Grant
Polishing pad
- Patent number D584591
- Issue date Jan 13, 2009
- JSR Corporation
- Hiroyuki Tano
- D08 - Tools and hardware
Information Patent Grant
Polishing pad
- Patent number D581237
- Issue date Nov 25, 2008
- JSR Corporation
- Takahiro Okamoto
- D08 - Tools and hardware
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 7,442,116
- Issue date Oct 28, 2008
- JSR Corporation
- Hiroyuki Miyauchi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number D576855
- Issue date Sep 16, 2008
- JSR Corporation
- Takahiro Okamoto
- D08 - Tools and hardware
Information Patent Grant
Chemical mechanical polishing pad and chemical mechanical polishing...
- Patent number 7,354,527
- Issue date Apr 8, 2008
- JSR Corporation
- Hiroyuki Tano
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing chemical mechanical polishing pad
- Patent number 7,329,174
- Issue date Feb 12, 2008
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for semiconductor wafer, polishing multilayered body...
- Patent number 7,323,415
- Issue date Jan 29, 2008
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number D560457
- Issue date Jan 29, 2008
- JSR Corporation
- Hiroyuki Miyauchi
- D08 - Tools and hardware
Information Patent Grant
Polishing pad
- Patent number D559648
- Issue date Jan 15, 2008
- JSR Corporation
- Hiroyuki Miyauchi
- D08 - Tools and hardware
Information Patent Grant
Polishing pad
- Patent number D559063
- Issue date Jan 8, 2008
- JSR Corporation
- Takahiro Okamoto
- D08 - Tools and hardware
Information Patent Grant
Polishing pad
- Patent number D559064
- Issue date Jan 8, 2008
- JSR Corporation
- Takahiro Okamoto
- D08 - Tools and hardware
Information Patent Grant
Polishing pad
- Patent number D559065
- Issue date Jan 8, 2008
- JSR Corporation
- Hiroyuki Miyauchi
- D08 - Tools and hardware
Information Patent Grant
Polishing pad
- Patent number D559066
- Issue date Jan 8, 2008
- JSR Corporation
- Hiroyuki Tano
- D08 - Tools and hardware
Information Patent Grant
Chemical mechanical polishing pad and chemical mechanical polishing...
- Patent number 7,183,213
- Issue date Feb 27, 2007
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Grant
Silane composition, silicon film forming method and solar cell prod...
- Patent number 7,173,180
- Issue date Feb 6, 2007
- JSR Corporation
- Hiroshi Shiho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silane composition, silicon film forming method and solar cell prod...
- Patent number 7,067,069
- Issue date Jun 27, 2006
- JSR Corporation
- Hiroshi Shiho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing pad
- Patent number 6,992,123
- Issue date Jan 31, 2006
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number 6,976,910
- Issue date Dec 20, 2005
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Grant
Aqueous dispersion, process for production thereof and coated subst...
- Patent number 6,953,821
- Issue date Oct 11, 2005
- JSR Corporation
- Kouji Tamori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ruthenium film, ruthenium oxide film and process for forming the same
- Patent number 6,875,518
- Issue date Apr 5, 2005
- JSR Corporation
- Hiroshi Shiho
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tantalum oxide film, use thereof, process for forming the same and...
- Patent number 6,806,210
- Issue date Oct 19, 2004
- JSR Corporation
- Hiroshi Shiho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating composition and hardened film obtained therefrom
- Patent number 6,660,394
- Issue date Dec 9, 2003
- JSR Corporation
- Kenji Ishizuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Gas barrier coating composition, process for producing the same, an...
- Patent number 6,656,602
- Issue date Dec 2, 2003
- JSR Corporation
- Satoshi Ishikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coating composition, and a coated film and glass each having a coat...
- Patent number 6,485,838
- Issue date Nov 26, 2002
- JSR Corporation
- Mibuko Shimada
- C03 - GLASS MINERAL OR SLAG WOOL

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMATION METHOD
- Publication number 20240307913
- Publication date Sep 19, 2024
- FLOSFIA INC.
- Makoto Shimizu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM FORMATION METHOD
- Publication number 20240309556
- Publication date Sep 19, 2024
- FLOSFIA INC.
- Makoto SHIMIZU
- C30 - CRYSTAL GROWTH
Information Patent Application
FILM FORMATION METHOD
- Publication number 20240307914
- Publication date Sep 19, 2024
- FLOSFIA INC.
- Makoto Shimizu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of manufacturing chemical mechanical polishing pad
- Publication number 20070082587
- Publication date Apr 12, 2007
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Application
Silane composition, silicon film forming method and solar cell prod...
- Publication number 20060185712
- Publication date Aug 24, 2006
- JSR Corporation
- Hiroshi Shiho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Polishing pad for semiconductor wafer and laminated body for polish...
- Publication number 20060128271
- Publication date Jun 15, 2006
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad and chemical mechanical polishing...
- Publication number 20060060569
- Publication date Mar 23, 2006
- JSR Corporation
- Hiroyuki Tano
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad and chemical mechanical polishing...
- Publication number 20050260929
- Publication date Nov 24, 2005
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad, manufacturing process thereof an...
- Publication number 20050245171
- Publication date Nov 3, 2005
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad, manufacturing process thereof an...
- Publication number 20050239380
- Publication date Oct 27, 2005
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad, production method thereof, and c...
- Publication number 20050222336
- Publication date Oct 6, 2005
- JSR Corporation
- Takahiro Okamoto
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad
- Publication number 20050113011
- Publication date May 26, 2005
- JSR Corporation
- Hiroyuki Miyauchi
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad and chemical mechanical polishing...
- Publication number 20050014376
- Publication date Jan 20, 2005
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad
- Publication number 20050003749
- Publication date Jan 6, 2005
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Application
Method of machining semiconductor wafer-use polishing pad and semic...
- Publication number 20040266326
- Publication date Dec 30, 2004
- Hiroshi Shiho
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Polishing pad and method of polishing a semiconductor wafer
- Publication number 20040224611
- Publication date Nov 11, 2004
- JSR Corporation
- Hiromi Aoi
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad and chemical mechanical polishing method
- Publication number 20040224616
- Publication date Nov 11, 2004
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Application
Abrasive pad, method and metal mold for manufacturing the same, and...
- Publication number 20040203320
- Publication date Oct 14, 2004
- JSR Corporation
- Yukio Hosaka
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad
- Publication number 20040118051
- Publication date Jun 24, 2004
- JSR Corporation
- Hiroshi Shiho
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad and multi-layer polishing pad
- Publication number 20040014413
- Publication date Jan 22, 2004
- JSR Corporation
- Nobuo Kawahashi
- B24 - GRINDING POLISHING
Information Patent Application
Gas barrier coating composition and method for manufacturing same
- Publication number 20030187113
- Publication date Oct 2, 2003
- JSR Corporation
- Hiroshi Shiho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Aqueous dispersion, process for production thereof and coated subst...
- Publication number 20030045626
- Publication date Mar 6, 2003
- Kouji Tamori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Silane composition, silicon film forming method and solar cell prod...
- Publication number 20030045632
- Publication date Mar 6, 2003
- JSR Corporation
- Hiroshi Shiho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rutenium film rutenium oxide film, and method for formation thereof
- Publication number 20030008157
- Publication date Jan 9, 2003
- Hiroshi Shiho
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Tantalum oxide film, use thereof, and method and composition for fo...
- Publication number 20030003235
- Publication date Jan 2, 2003
- Hiroshi Shiho
- C01 - INORGANIC CHEMISTRY

Hiroshi Shiho

Person

Patents Grantslast 30 patents

Polishing pad

Polishing pad

Polishing pad

Polishing pad

Polishing pad

Chemical mechanical polishing pad

Polishing pad

Chemical mechanical polishing pad and chemical mechanical polishing...

Method of manufacturing chemical mechanical polishing pad

Polishing pad for semiconductor wafer, polishing multilayered body...

Polishing pad

Polishing pad

Polishing pad

Polishing pad

Polishing pad

Polishing pad

Chemical mechanical polishing pad and chemical mechanical polishing...

Silane composition, silicon film forming method and solar cell prod...

Silane composition, silicon film forming method and solar cell prod...

Polishing pad

Polishing pad

Aqueous dispersion, process for production thereof and coated subst...

Ruthenium film, ruthenium oxide film and process for forming the same

Tantalum oxide film, use thereof, process for forming the same and...

Coating composition and hardened film obtained therefrom

Gas barrier coating composition, process for producing the same, an...

Coating composition, and a coated film and glass each having a coat...

Patents Applicationslast 30 patents

FILM FORMATION METHOD

FILM FORMATION METHOD

FILM FORMATION METHOD

Method of manufacturing chemical mechanical polishing pad

Silane composition, silicon film forming method and solar cell prod...

Polishing pad for semiconductor wafer and laminated body for polish...

Chemical mechanical polishing pad and chemical mechanical polishing...

Chemical mechanical polishing pad and chemical mechanical polishing...

Chemical mechanical polishing pad, manufacturing process thereof an...

Chemical mechanical polishing pad, manufacturing process thereof an...

Chemical mechanical polishing pad, production method thereof, and c...

Chemical mechanical polishing pad

Chemical mechanical polishing pad and chemical mechanical polishing...

Polishing pad

Method of machining semiconductor wafer-use polishing pad and semic...

Polishing pad and method of polishing a semiconductor wafer

Polishing pad and chemical mechanical polishing method

Abrasive pad, method and metal mold for manufacturing the same, and...

Polishing pad

Polishing pad and multi-layer polishing pad

Gas barrier coating composition and method for manufacturing same

Aqueous dispersion, process for production thereof and coated subst...

Silane composition, silicon film forming method and solar cell prod...

Rutenium film rutenium oxide film, and method for formation thereof

Tantalum oxide film, use thereof, and method and composition for fo...