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Photoresist composition
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Patent number 6,040,112
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Issue date Mar 21, 2000
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Sumitomo Chemical Company, Limited
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Yuko Yako
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Positive resist composition
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Patent number 5,916,728
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Issue date Jun 29, 1999
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Sumitomo Chemical Company, Limited
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Nobuhito Fukui
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Positive resist composition
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Patent number 5,891,601
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Issue date Apr 6, 1999
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Sumitomo Chemical Company, Ltd.
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Nobuhito Fukui
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition
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Patent number 5,360,696
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Issue date Nov 1, 1994
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Sumitomo Chemical Co., Ltd.
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Yukio Hanamoto
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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