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Dry etching method and apparatus
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Patent number 6,893,971
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Issue date May 17, 2005
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Matsushita Electric Industrial Co., Ltd.
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Hiroshi Tanabe
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing apparatus
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Patent number 5,766,364
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Issue date Jun 16, 1998
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Matsushita Electric Industrial Co., Ltd.
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Toshimichi Ishida
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Plasma CVD system
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Patent number 5,372,648
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Issue date Dec 13, 1994
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Matsushita Electric Industrial Co., Ltd.
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Shigeyuki Yamamoto
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...