Hiroshi Tsujimoto

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing device, substrate processing system, control m...
- Patent number 12,354,841
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,217,942
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and control method of substrate proc...
- Patent number 11,676,800
- Issue date Jun 13, 2023
- Tokyo Electron Limited
- Ikko Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,557,498
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Toru Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,538,707
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Toru Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and processing apparatus
- Patent number 10,867,778
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,861,675
- Issue date Dec 8, 2020
- Tokyo Electron Limited
- Takao Funakubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for inspecting flow rate controller and method for processin...
- Patent number 10,480,978
- Issue date Nov 19, 2019
- Tokyo Electron Limited
- Kumiko Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas supplying method and semiconductor manufacturing apparatus
- Patent number 10,410,840
- Issue date Sep 10, 2019
- Tokyo Electron Limited
- Tomoyuki Mizutani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 10,269,539
- Issue date Apr 23, 2019
- Tokyo Electron Limited
- Kumiko Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,204,763
- Issue date Feb 12, 2019
- Tokyo Electron Limited
- Takao Funakubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature control method and plasma processing apparatus
- Patent number 10,163,607
- Issue date Dec 25, 2018
- Tokyo Electron Limited
- Keigo Toyoda
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing method
- Patent number 9,960,016
- Issue date May 1, 2018
- Tokyo Electron Limited
- Kumiko Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for supplying gas, and plasma processing apparatus
- Patent number 9,947,510
- Issue date Apr 17, 2018
- Tokyo Electron Limited
- Tomoyuki Mizutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply control method
- Patent number 9,904,299
- Issue date Feb 27, 2018
- Tokyo Electron Limited
- Kumiko Ono
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing method
- Patent number 9,818,582
- Issue date Nov 14, 2017
- Tokyo Electron Limited
- Hiraku Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 9,728,418
- Issue date Aug 8, 2017
- Tokyo Electron Limited
- Keigo Toyoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma etching method
- Patent number 9,583,315
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 9,524,847
- Issue date Dec 20, 2016
- Tokyo Electron Limited
- Nobuhiro Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 9,455,125
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Akihiro Yoshimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,858,754
- Issue date Oct 14, 2014
- Tokyo Electron Limited
- Masato Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,592,319
- Issue date Nov 26, 2013
- Tokyo Electron Limited
- Nobuhiro Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method for measuring distance betwe...
- Patent number 8,383,000
- Issue date Feb 26, 2013
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- G01 - MEASURING TESTING
Information Patent Grant
Method for heating a focus ring in a plasma apparatus by high frequ...
- Patent number 8,328,981
- Issue date Dec 11, 2012
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,277,673
- Issue date Oct 2, 2012
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 8,070,972
- Issue date Dec 6, 2011
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for manufacturing semiconductor device, contro...
- Patent number 7,569,478
- Issue date Aug 4, 2009
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250218725
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250183012
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250174434
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Kota SHIHOMMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250166975
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240222090
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD AND PLASMA PROCESSING APPARATUS
- Publication number 20220403518
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Hisashi HIROSE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UPPER ELECTRODE ASSEMBLY
- Publication number 20220319815
- Publication date Oct 6, 2022
- TOKYO ELECTRON LIMITED
- Lifu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220301832
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Takashi Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220301830
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Lifu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220157567
- Publication date May 19, 2022
- TOKYO ELECTRON LIMITED
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD OF SUBSTRATE PROC...
- Publication number 20210335577
- Publication date Oct 28, 2021
- TOKYO ELECTRON LIMITED
- Ikko TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING, SUBSTRATE SUPPORT, PLASMA PROCESSING SYSTEM AND METHOD O...
- Publication number 20210305022
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, CONTROL M...
- Publication number 20210305030
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING DEVICE
- Publication number 20210043431
- Publication date Feb 11, 2021
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200312695
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Toru TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND PROCESSING APPARATUS
- Publication number 20190295825
- Publication date Sep 26, 2019
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR APPLYING DC VOLTAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20190237305
- Publication date Aug 1, 2019
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190139744
- Publication date May 9, 2019
- TOKYO ELECTRON LIMITED
- Takao FUNAKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INSPECTING FLOW RATE CONTROLLER AND METHOD FOR PROCESSIN...
- Publication number 20180286721
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Kumiko ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20180218882
- Publication date Aug 2, 2018
- TOKYO ELECTRON LIMITED
- Kumiko Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SUPPLYING GAS, AND PLASMA PROCESSING APPARATUS
- Publication number 20180166257
- Publication date Jun 14, 2018
- TOKYO ELECTRON LIMITED
- Tomoyuki MIZUTANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20170278675
- Publication date Sep 28, 2017
- TOKYO ELECTRON LIMITED
- Kumiko Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20160372308
- Publication date Dec 22, 2016
- TOKYO ELECTRON LIMITED
- Hiraku MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20160365229
- Publication date Dec 15, 2016
- TOKYO ELECTRON LIMITED
- Keigo TOYODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY CONTROL METHOD
- Publication number 20160299514
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Kumiko ONO
- G05 - CONTROLLING REGULATING
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20160079074
- Publication date Mar 17, 2016
- TOKYO ELECTRON LIMITED
- Keigo TOYODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SUPPLYING GAS, AND PLASMA PROCESSING APPARATUS
- Publication number 20160064192
- Publication date Mar 3, 2016
- TOKYO ELECTRON LIMITED
- Tomoyuki MIZUTANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20160056021
- Publication date Feb 25, 2016
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150380282
- Publication date Dec 31, 2015
- TOKYO ELECTRON LIMITED
- Takao FUNAKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD FOR PLASMA PROCESSING APPARATUS
- Publication number 20150243489
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Hiroshi Uda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hiroshi Tsujimoto

Person

Patents Grantslast 30 patents

Substrate processing device, substrate processing system, control m...

Plasma processing apparatus

Substrate processing apparatus and control method of substrate proc...

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Cleaning method and processing apparatus

Plasma processing apparatus and plasma processing method

Method for inspecting flow rate controller and method for processin...

Gas supplying method and semiconductor manufacturing apparatus

Plasma processing method

Plasma processing apparatus and plasma processing method

Temperature control method and plasma processing apparatus

Plasma processing method

Method for supplying gas, and plasma processing apparatus

Gas supply control method

Plasma processing method

Etching method and etching apparatus

Plasma etching apparatus and plasma etching method

Substrate processing apparatus

Substrate processing apparatus

Plasma processing apparatus

Substrate processing method and substrate processing apparatus

Substrate processing apparatus, method for measuring distance betwe...

Method for heating a focus ring in a plasma apparatus by high frequ...

Plasma processing method and apparatus

Etching method and etching apparatus

Method and apparatus for manufacturing semiconductor device, contro...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS

SHOWER HEAD AND PLASMA PROCESSING APPARATUS

UPPER ELECTRODE ASSEMBLY

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD OF SUBSTRATE PROC...

EDGE RING, SUBSTRATE SUPPORT, PLASMA PROCESSING SYSTEM AND METHOD O...

SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, CONTROL M...

PLASMA ETCHING METHOD AND PLASMA ETCHING DEVICE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

CLEANING METHOD AND PROCESSING APPARATUS

METHOD FOR APPLYING DC VOLTAGE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR INSPECTING FLOW RATE CONTROLLER AND METHOD FOR PROCESSIN...

PLASMA PROCESSING METHOD

METHOD FOR SUPPLYING GAS, AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

TEMPERATURE CONTROL METHOD AND PLASMA PROCESSING APPARATUS

GAS SUPPLY CONTROL METHOD

ETCHING METHOD AND ETCHING APPARATUS

METHOD FOR SUPPLYING GAS, AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CLEANING METHOD FOR PLASMA PROCESSING APPARATUS