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Hiroto YAMAZAKI
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Resist composition, method of forming resist pattern, and acid diff...
Patent number
11,762,288
Issue date
Sep 19, 2023
Tokyo Ohka Kogyo Co., Ltd.
Hiroto Yamazaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method of forming resist pattern, compound, aci...
Patent number
11,667,605
Issue date
Jun 6, 2023
Tokyo Ohka Kogyo Co., Ltd.
Hiroto Yamazaki
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition, method of forming resist pattern, compound, aci...
Patent number
11,281,099
Issue date
Mar 22, 2022
Tokyo Ohka Kogyo Co., Ltd.
Hiroto Yamazaki
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition, and method of forming resist pattern
Patent number
11,256,169
Issue date
Feb 22, 2022
Tokyo Ohka Kogyo Co., Ltd.
Takuya Ikeda
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition, method of forming resist pattern, and polymer c...
Patent number
10,976,661
Issue date
Apr 13, 2021
Tokyo Ohka Kogyo Co., Ltd.
Hiroto Yamazaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
10,606,174
Issue date
Mar 31, 2020
Tokyo Ohka Kogyo Co., Ltd.
Masahito Yahagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-type resist composition, method for forming resist pattern...
Patent number
9,766,541
Issue date
Sep 19, 2017
Tokyo Ohka Kogyo Co., Ltd.
Hiroto Yamazaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...
Publication number
20210389668
Publication date
Dec 16, 2021
Tokyo Ohka Kogyo Co., Ltd.
Hiroto YAMAZAKI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND ACID DIFF...
Publication number
20210200089
Publication date
Jul 1, 2021
Tokyo Ohka Kogyo Co., Ltd.
Hiroto YAMAZAKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
Publication number
20190361346
Publication date
Nov 28, 2019
Tokyo Ohka Kogyo Co., Ltd.
Takuya IKEDA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, ACI...
Publication number
20190361344
Publication date
Nov 28, 2019
Tokyo Ohka Kogyo Co., Ltd.
Hiroto YAMAZAKI
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER C...
Publication number
20190018319
Publication date
Jan 17, 2019
Tokyo Ohka Kogyo Co., Ltd.
Hiroto YAMAZAKI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20180210338
Publication date
Jul 26, 2018
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
Publication number
20160376233
Publication date
Dec 29, 2016
Tokyo Ohka Kogyo Co., Ltd.
Hiroto YAMAZAKI
C07 - ORGANIC CHEMISTRY