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Hiroto Yukawa
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Livingston, GB
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last 30 patents
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Patent Grant
Positive-working chemical-amplification photoresist composition
Patent number
6,815,144
Issue date
Nov 9, 2004
Tokyo Ohka Kogyo Co., Ltd.
Katsumi Oomori
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive resist composition and positive resist base material using...
Patent number
6,649,322
Issue date
Nov 18, 2003
Tokyo Ohka Kogyo Co., Ltd.
Satoshi Kumon
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
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Patent Application
Positive-working chemical-amplification photoresist composition
Publication number
20050042544
Publication date
Feb 24, 2005
Katsumi Oomori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
Positive-working chemical-amplification photoresist composition
Publication number
20020094489
Publication date
Jul 18, 2002
Katsumi Oomori
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
Positive-working chemical-amplification photoresist composition
Publication number
20020090571
Publication date
Jul 11, 2002
Katsumi Oomori
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
Positive resist composition and positive resist base material using...
Publication number
20020076649
Publication date
Jun 20, 2002
Tokyo Ohka Kogyo Co., Ltd.
Satoshi Kumon
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC