Hirotomo KAWAHARA

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Cupertino, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 11,982,935
- Issue date May 14, 2024
- AGC Inc.
- Hirotomo Kawahara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20240201576
- Publication date Jun 20, 2024
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTION-TYPE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTION-TYPE MAS...
- Publication number 20230288794
- Publication date Sep 14, 2023
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20220075256
- Publication date Mar 10, 2022
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS