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Hirotoshi Fujie

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  • Kawagoe, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Diazodisulfones
    • Patent number RE40211
    • Issue date Apr 1, 2008
    • Wako Pure Chemical Industries, Ltd.
    • Fumiyoshi Urano
    • 534 - Organic compounds
  • Information Patent Grant

    Resist Composition
    • Patent number 6,716,573
    • Issue date Apr 6, 2004
    • Wako Pure Chemical Industries, Ltd.
    • Hirotoshi Fujie
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Resist composition
    • Patent number 6,656,660
    • Issue date Dec 2, 2003
    • Sumitomo Chemical Company, Limited
    • Fumiyoshi Urano
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Resist composition
    • Patent number 6,432,608
    • Issue date Aug 13, 2002
    • Wako Pure Chemical Industries, Ltd.
    • Hirotoshi Fujie
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Resist composition containing specific cross-linking agent
    • Patent number 6,335,143
    • Issue date Jan 1, 2002
    • Wako Pure Chemical Industries Ltd.
    • Motoshige Sumino
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Agent for reducing the substrate dependence of resist
    • Patent number 6,303,264
    • Issue date Oct 16, 2001
    • Wako Pure Chemical Industries, Ltd.
    • Hirotoshi Fujie
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Polymer and resist material
    • Patent number 6,033,826
    • Issue date Mar 7, 2000
    • Wako Pure Chemical Industries, Ltd.
    • Fumiyoshi Urano
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Polymer composition and resist material
    • Patent number 5,976,759
    • Issue date Nov 2, 1999
    • Wako Pure Chemical Industries, Ltd.
    • Fumiyoshi Urano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pattern formation process
    • Patent number 5,670,299
    • Issue date Sep 23, 1997
    • Wako Pure Chemical Industries, Ltd.
    • Fumiyoshi Urano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Resist material
    • Patent number 5,627,006
    • Issue date May 6, 1997
    • Wako Pure Chemical Industries, Ltd.
    • Fumiyoshi Urano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Resist material and pattern formation process
    • Patent number 5,468,589
    • Issue date Nov 21, 1995
    • Wako Pure Chemical Industries, Ltd.
    • Fumiyoshi Urano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Chemical amplified resist material containing photosensitive compou...
    • Patent number 5,350,660
    • Issue date Sep 27, 1994
    • Wako Pure Chemical Industries, Ltd.
    • Fumiyoshi Urano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Diazodisulfones
    • Patent number 5,216,135
    • Issue date Jun 1, 1993
    • Wako Pure Chemical Industries, Ltd.
    • Fumiyoshi Urano
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    Resist composition
    • Publication number 20030039920
    • Publication date Feb 27, 2003
    • Wako Pure Chemical Industries, LTD.
    • Hirotoshi Fujie
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...