Hirotoshi Ise

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Glass substrate-holding tool and method for producing an EUV mask b...
- Patent number 8,967,608
- Issue date Mar 3, 2015
- Asahi Glass Company, Limited
- Takahiro Mitsumori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Glass substrate-holding tool and method for producing an EUV mask b...
- Patent number 8,837,108
- Issue date Sep 16, 2014
- Asahi Glass Company, Limited
- Takahiro Mitsumori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma processing system in which wafer is retained by electrostati...
- Patent number 7,137,352
- Issue date Nov 21, 2006
- Renesas Technology Corp.
- Toshihiro Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Centrifugal dryer, manufacturing method for semiconductor device an...
- Patent number 6,993,854
- Issue date Feb 7, 2006
- Renesas Technology Corp.
- Hirotoshi Ise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect inspecting device for substrate to be processed and method o...
- Patent number 6,768,542
- Issue date Jul 27, 2004
- Renesas Technology Corp.
- Hirotoshi Ise
- G01 - MEASURING TESTING
Information Patent Grant
Etching apparatus, etching method, manufacturing method of a semico...
- Patent number 6,218,196
- Issue date Apr 17, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Hirotoshi Ise
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GLASS SUBSTRATE-HOLDING TOOL AND METHOD FOR PRODUCING AN EUV MASK B...
- Publication number 20120321999
- Publication date Dec 20, 2012
- Asahi Glass Company, Limited
- Takahiro MITSUMORI
- B82 - NANO-TECHNOLOGY
Information Patent Application
GLASS SUBSTRATE-HOLDING TOOL AND METHOD FOR PRODUCING AN EUV MASK B...
- Publication number 20120183683
- Publication date Jul 19, 2012
- Asahi Glass Company, Limited
- Takahiro MITSUMORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR PRODUCING REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20110266140
- Publication date Nov 3, 2011
- ASAHI GLASS COMPANY LIMITED
- Takeru KINOSHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device for examining end part
- Publication number 20050024630
- Publication date Feb 3, 2005
- RENESAS TECHNOLOGY CORP.
- Toshiki Ohno
- G01 - MEASURING TESTING
Information Patent Application
Defect inspecting device for substrate to be processed and method o...
- Publication number 20030053046
- Publication date Mar 20, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Hirotoshi Ise
- G01 - MEASURING TESTING
Information Patent Application
Centrifugal dryer, manufacturing method for semiconductor device an...
- Publication number 20030051366
- Publication date Mar 20, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Hirotoshi Ise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system in which wafer is retained by electrostati...
- Publication number 20020086546
- Publication date Jul 4, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Toshihiro Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning equipment, cleaning method, semiconductor manufacturing de...
- Publication number 20020036001
- Publication date Mar 28, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Hirotoshi Ise
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hirotoshi Ise

Person

Patents Grantslast 30 patents

Glass substrate-holding tool and method for producing an EUV mask b...

Glass substrate-holding tool and method for producing an EUV mask b...

Plasma processing system in which wafer is retained by electrostati...

Centrifugal dryer, manufacturing method for semiconductor device an...

Defect inspecting device for substrate to be processed and method o...

Etching apparatus, etching method, manufacturing method of a semico...

Patents Applicationslast 30 patents

GLASS SUBSTRATE-HOLDING TOOL AND METHOD FOR PRODUCING AN EUV MASK B...

GLASS SUBSTRATE-HOLDING TOOL AND METHOD FOR PRODUCING AN EUV MASK B...

PROCESS FOR PRODUCING REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

Device for examining end part

Defect inspecting device for substrate to be processed and method o...

Centrifugal dryer, manufacturing method for semiconductor device an...

Plasma processing system in which wafer is retained by electrostati...

Cleaning equipment, cleaning method, semiconductor manufacturing de...