Hirotsugu Nagayama

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Water-repellant glass products and process for the production thereof
- Patent number 5,415,927
- Issue date May 16, 1995
- Nippon Sheet Glass Co., Ltd.
- Naoto Hirayama
- B32 - LAYERED PRODUCTS
Information Patent Grant
Process for depositing silicon dioxide films
- Patent number 5,132,140
- Issue date Jul 21, 1992
- Nippon Sheet Glass Co., Ltd.
- Takuji Goda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing a silicon dioxide film
- Patent number 5,073,408
- Issue date Dec 17, 1991
- Nippin Sheet Glass Co., Ltd.
- Takuji Goda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for production of oxide film
- Patent number 4,882,183
- Issue date Nov 21, 1989
- Nippon Sheet Glass Co., Ltd.
- Juichi Ino
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Electrochromic device
- Patent number 4,726,664
- Issue date Feb 23, 1988
- Nippon Sheet Glass Co., Ltd.
- Hiroaki Tada
- G02 - OPTICS
Information Patent Grant
Method of depositing a silicon dioxide film
- Patent number 4,693,916
- Issue date Sep 15, 1987
- Nippon Sheet Glass Co., Ltd.
- Hirotsugu Nagayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for making a silicon dioxide coating
- Patent number 4,468,420
- Issue date Aug 28, 1984
- Nippon Sheet Glass Co., Ltd.
- Hideo Kawahara
- C03 - GLASS MINERAL OR SLAG WOOL

Hirotsugu Nagayama

Person

Patents Grantslast 30 patents

Water-repellant glass products and process for the production thereof

Process for depositing silicon dioxide films

Method of depositing a silicon dioxide film

Method for production of oxide film

Electrochromic device

Method of depositing a silicon dioxide film

Method for making a silicon dioxide coating