Hiroyoshi Tanabe

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 12,038,685
- Issue date Jul 16, 2024
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,914,283
- Issue date Feb 27, 2024
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV exposure, and reflective mask
- Patent number 11,835,852
- Issue date Dec 5, 2023
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 11,698,580
- Issue date Jul 11, 2023
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV exposure, and reflective mask
- Patent number 11,281,088
- Issue date Mar 22, 2022
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, and process for producing r...
- Patent number 10,890,842
- Issue date Jan 12, 2021
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of exposure using same
- Patent number 6,150,059
- Issue date Nov 21, 2000
- NEC Corporation
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase-shift mask and halftone phase-shift mask defect corr...
- Patent number 5,945,237
- Issue date Aug 31, 1999
- NEC Corporation
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of fabricating photo-mask used for modified illumination, p...
- Patent number 5,631,110
- Issue date May 20, 1997
- NEC Corporation
- Satomi Shioiri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure system and illuminating apparatus used therein and method...
- Patent number 5,559,583
- Issue date Sep 24, 1996
- NEC Corporation
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and system used therefor
- Patent number 5,476,736
- Issue date Dec 19, 1995
- NEC Corporation
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projector for exposing photosensitive substrate
- Patent number 5,434,647
- Issue date Jul 18, 1995
- NEC Corporation
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting mask
- Patent number 5,275,894
- Issue date Jan 4, 1994
- NEC Corporation
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240176225
- Publication date May 30, 2024
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20230305383
- Publication date Sep 28, 2023
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION-TYPE MASK, REFLECTION-TYPE MASK BLANK, AND METHOD FOR MA...
- Publication number 20230185181
- Publication date Jun 15, 2023
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20220299862
- Publication date Sep 22, 2022
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20220236636
- Publication date Jul 28, 2022
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUVL, REFLECTIVE MASK FOR EUVL, AND METHO...
- Publication number 20220187699
- Publication date Jun 16, 2022
- AGC Inc.
- Hiroyoshi TANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV EXPOSURE, AND REFLECTIVE MASK
- Publication number 20220163879
- Publication date May 26, 2022
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND PROCESS FOR PRODUCING R...
- Publication number 20210349387
- Publication date Nov 11, 2021
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20210325772
- Publication date Oct 21, 2021
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...
- Publication number 20190384156
- Publication date Dec 19, 2019
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND PROCESS FOR PRODUCING R...
- Publication number 20190086791
- Publication date Mar 21, 2019
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV EXPOSURE, AND REFLECTIVE MASK
- Publication number 20180299766
- Publication date Oct 18, 2018
- Asahi Glass Company, Limited
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiroyoshi Tanabe

Person

Patents Grantslast 30 patents

Reflective mask blank for EUV lithography

Reflective mask blank and reflective mask

Reflective mask blank for EUV exposure, and reflective mask

Reflective mask blank for EUV lithography

Reflective mask blank for EUV exposure, and reflective mask

Reflective mask blank, reflective mask, and process for producing r...

Photomask and method of exposure using same

Halftone phase-shift mask and halftone phase-shift mask defect corr...

Process of fabricating photo-mask used for modified illumination, p...

Exposure system and illuminating apparatus used therein and method...

Projection exposure method and system used therefor

Projector for exposing photosensitive substrate

Phase shifting mask

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTION-TYPE MASK, REFLECTION-TYPE MASK BLANK, AND METHOD FOR MA...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK FOR EUVL, REFLECTIVE MASK FOR EUVL, AND METHO...

REFLECTIVE MASK BLANK FOR EUV EXPOSURE, AND REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND PROCESS FOR PRODUCING R...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND PROCESS FOR PRODUCING R...

REFLECTIVE MASK BLANK FOR EUV EXPOSURE, AND REFLECTIVE MASK