Hiroyuki Akagawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask blank providing system, mask blank providing method, mask blan...
- Patent number 8,318,388
- Issue date Nov 27, 2012
- Hoya Corporation
- Osamu Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask blank providing system, mask blank providing method, mask blan...
- Patent number 7,998,644
- Issue date Aug 16, 2011
- Hoya Corporation
- Osamu Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask blank substrate, mask blank, exposure mask, mask blank substra...
- Patent number 7,892,708
- Issue date Feb 22, 2011
- Hoya Corporation
- Masaru Tanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask blank substrate, mask blank, exposure mask, mask blank substra...
- Patent number 7,745,074
- Issue date Jun 29, 2010
- Hoya Corporation
- Masaru Tanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask blank providing system, mask blank providing method, mask blan...
- Patent number 7,700,244
- Issue date Apr 20, 2010
- Hoya Corporation
- Osamu Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask blank substrate, mask blank, exposure mask, mask blank substra...
- Patent number 7,592,104
- Issue date Sep 22, 2009
- Hoya Corporation
- Masaru Tanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate for reticle and method of manufacturing the substrate, an...
- Patent number 7,579,120
- Issue date Aug 25, 2009
- Hoya Corporation
- Hiroyuki Akagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLAN...
- Publication number 20110262847
- Publication date Oct 27, 2011
- HOYA CORPORATION
- Osamu Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, EXPOSURE MASK, MASK BLANK SUBSTRA...
- Publication number 20100248092
- Publication date Sep 30, 2010
- HOYA CORPORATION
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLAN...
- Publication number 20100173232
- Publication date Jul 8, 2010
- HOYA CORPORATION
- Osamu Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, MASK BLANK, EXPOSURE MASK, MASK BLANK SUBSTRA...
- Publication number 20100035164
- Publication date Feb 11, 2010
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate for reticle and method of manufacturing the substrate, an...
- Publication number 20060223224
- Publication date Oct 5, 2006
- Hiroyuki Akagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask blank providing system, mask blank providing method, mask blan...
- Publication number 20060159931
- Publication date Jul 20, 2006
- Hoya Corporation
- Osamu Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask blank substrate, mask blank, exposure mask, mask blank substra...
- Publication number 20060068300
- Publication date Mar 30, 2006
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiroyuki Akagawa

Person

Patents Grantslast 30 patents

Mask blank providing system, mask blank providing method, mask blan...

Mask blank providing system, mask blank providing method, mask blan...

Mask blank substrate, mask blank, exposure mask, mask blank substra...

Mask blank substrate, mask blank, exposure mask, mask blank substra...

Mask blank providing system, mask blank providing method, mask blan...

Mask blank substrate, mask blank, exposure mask, mask blank substra...

Substrate for reticle and method of manufacturing the substrate, an...

Patents Applicationslast 30 patents

MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLAN...

MASK BLANK SUBSTRATE, MASK BLANK, EXPOSURE MASK, MASK BLANK SUBSTRA...

MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLAN...

MASK BLANK SUBSTRATE, MASK BLANK, EXPOSURE MASK, MASK BLANK SUBSTRA...

Substrate for reticle and method of manufacturing the substrate, an...

Mask blank providing system, mask blank providing method, mask blan...

Mask blank substrate, mask blank, exposure mask, mask blank substra...