Hiroyuki HAYASHI

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning method and substrate processing apparatus
- Patent number 12,252,786
- Issue date Mar 18, 2025
- Tokyo Electron Limited
- Yoshihiro Takezawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing silicon film and film deposition apparatus
- Patent number 12,080,552
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Tatsuya Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply apparatus and gas supply method
- Patent number 11,866,825
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Hiroyuki Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,658,028
- Issue date May 23, 2023
- Tokyo Electron Limited
- Rui Kanemura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,587,787
- Issue date Feb 21, 2023
- Tokyo Electron Limited
- Yoshihiro Takezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat insulation structure at lower end of vertical heat treatment a...
- Patent number 11,424,143
- Issue date Aug 23, 2022
- Tokyo Electron Limited
- Koji Yoshii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,410,847
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Hiroyuki Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method of substrate processing apparatus and substrate pro...
- Patent number 11,260,433
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Yoshihiro Takezawa
- B08 - CLEANING
Information Patent Grant
Film forming method and substrate processing apparatus
- Patent number 11,251,034
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Hiroyuki Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and heat treatment apparatus
- Patent number 11,239,076
- Issue date Feb 1, 2022
- Tokyo Electron Limited
- Yutaka Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus and heat treatment method
- Patent number 11,211,265
- Issue date Dec 28, 2021
- Tokyo Electron Limited
- Satoshi Takagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,101,131
- Issue date Aug 24, 2021
- Tokyo Electron Limited
- Rui Kanemura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming silicon film
- Patent number 10,854,449
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Satoshi Takagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon film forming method, thin film forming method and cross-sec...
- Patent number 9,758,865
- Issue date Sep 12, 2017
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220384146
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Syouji YAMAGISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220364228
- Publication date Nov 17, 2022
- Tokyo Electron Limited
- Yoshihiro TAKEZAWA
- B08 - CLEANING
Information Patent Application
METHOD OF DEPOSITING SILICON FILM AND FILM DEPOSITION APPARATUS
- Publication number 20220319845
- Publication date Oct 6, 2022
- TOKYO ELECTRON LIMITED
- Tatsuya MIYAHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY APPARATUS AND GAS SUPPLY METHOD
- Publication number 20220010430
- Publication date Jan 13, 2022
- TOKYO ELECTRON LIMITED
- Hiroyuki HAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20210202248
- Publication date Jul 1, 2021
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200312677
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200312661
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Hiroyuki HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND HEAT TREATMENT APPARATUS
- Publication number 20200294800
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cleaning Method of Substrate Processing Apparatus and Substrate Pro...
- Publication number 20200230666
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- B08 - CLEANING
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200058504
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200058499
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD
- Publication number 20190318945
- Publication date Oct 17, 2019
- TOKYO ELECTRON LIMITED
- Satoshi Takagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20190309420
- Publication date Oct 10, 2019
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT INSULATION STRUCTURE AND VERTICAL HEAT TREATMENT APPARATUS
- Publication number 20190287828
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Koji Yoshii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190259599
- Publication date Aug 22, 2019
- TOKYO ELECTRON LIMITED
- Hiroyuki HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Forming Silicon Film
- Publication number 20190043719
- Publication date Feb 7, 2019
- TOKYO ELECTRON LIMITED
- Satoshi TAKAGI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE HEATING APPARATUS AND PROCESSING METHOD
- Publication number 20150129586
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Film Forming Method, Thin Film Forming Method and Cross-Sec...
- Publication number 20150037970
- Publication date Feb 5, 2015
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE HEATING APPARATUS
- Publication number 20140291318
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Kouji SHIMOMURA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE PROCESSING APPARATUS AND MICROWAVE PROCESSING METHOD
- Publication number 20140248784
- Publication date Sep 4, 2014
- TOKYO ELECTRON LIMITED
- Hiroyuki HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS

Hiroyuki HAYASHI

Person

Patents Grantslast 30 patents

Cleaning method and substrate processing apparatus

Method of depositing silicon film and film deposition apparatus

Gas supply apparatus and gas supply method

Film forming method and film forming apparatus

Film forming method and film forming apparatus

Heat insulation structure at lower end of vertical heat treatment a...

Film forming method and film forming apparatus

Cleaning method of substrate processing apparatus and substrate pro...

Film forming method and substrate processing apparatus

Film forming method and heat treatment apparatus

Heat treatment apparatus and heat treatment method

Film forming method and film forming apparatus

Method and apparatus for forming silicon film

Silicon film forming method, thin film forming method and cross-sec...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD OF DEPOSITING SILICON FILM AND FILM DEPOSITION APPARATUS

GAS SUPPLY APPARATUS AND GAS SUPPLY METHOD

FILM FORMING METHOD AND FILM FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND HEAT TREATMENT APPARATUS

Cleaning Method of Substrate Processing Apparatus and Substrate Pro...

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD

Substrate Processing Apparatus and Substrate Processing Method

HEAT INSULATION STRUCTURE AND VERTICAL HEAT TREATMENT APPARATUS

FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS

Method and Apparatus for Forming Silicon Film

MICROWAVE HEATING APPARATUS AND PROCESSING METHOD

Silicon Film Forming Method, Thin Film Forming Method and Cross-Sec...

MICROWAVE HEATING APPARATUS

MICROWAVE PROCESSING APPARATUS AND MICROWAVE PROCESSING METHOD