Hiroyuki Hiraiwa

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing optical member
- Patent number 6,994,747
- Issue date Feb 7, 2006
- Nikon Corporation
- Hiroyuki Hiraiwa
- G02 - OPTICS
Information Patent Grant
Optical member for photolithography and method of evaluating the same
- Patent number 6,829,039
- Issue date Dec 7, 2004
- Nikon Corporation
- Kazumasa Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing silica glass member and silica glass member...
- Patent number 6,769,273
- Issue date Aug 3, 2004
- Nikon Corporation
- Kazuhiro Nakagawa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Product method of synthetic silica glass and thermal treatment appa...
- Patent number 6,732,546
- Issue date May 11, 2004
- Nikon Corporation
- Shouji Yajima
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass member, method for producing the same, and projection...
- Patent number 6,672,109
- Issue date Jan 6, 2004
- Nikon Corporation
- Hiroyuki Hiraiwa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Projection optical system, production method thereof, and projectio...
- Patent number 6,583,931
- Issue date Jun 24, 2003
- Nikon Corporation
- Hiroyuki Hiraiwa
- G02 - OPTICS
Information Patent Grant
Exposure apparatus including silica glass and method for producing...
- Patent number 6,518,210
- Issue date Feb 11, 2003
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Projection optical system, production method thereof, and projectio...
- Patent number 6,366,404
- Issue date Apr 2, 2002
- Nikon Corporation
- Hiroyuki Hiraiwa
- G02 - OPTICS
Information Patent Grant
Automatic morphing photography booth
- Patent number 6,229,904
- Issue date May 8, 2001
- American Alpha, Inc
- Sming Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing silica glass used for photolithography
- Patent number 6,189,339
- Issue date Feb 20, 2001
- Nikon Corporation
- Hiroyuki Hiraiwa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Optical member for photolithography, method for evaluating optical...
- Patent number 6,181,469
- Issue date Jan 30, 2001
- Nikon Corporation
- Hiroyuki Hiraiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a piece of glass for measuring transmittance
- Patent number 6,129,987
- Issue date Oct 10, 2000
- Nikon Corporation
- Hiroki Jinbo
- G01 - MEASURING TESTING
Information Patent Grant
Liquid material supplying apparatus and liquid material supplying m...
- Patent number 6,116,260
- Issue date Sep 12, 2000
- Nikon Corporation
- Kazuhiro Nakagawa
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Illuminating apparatus
- Patent number 6,108,126
- Issue date Aug 22, 2000
- Nikon Corporation
- Shigeru Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silica glass for photolithography
- Patent number 6,087,283
- Issue date Jul 11, 2000
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Optical member for photolithography, method for evaluating optical...
- Patent number 6,025,955
- Issue date Feb 15, 2000
- Nikon Corporation
- Hiroyuki Hiraiwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing silica glass
- Patent number 5,958,809
- Issue date Sep 28, 1999
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for producing a silica glass
- Patent number 5,908,482
- Issue date Jun 1, 1999
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Automatic photograph booth for forming sketches
- Patent number 5,897,220
- Issue date Apr 27, 1999
- American Alpha Inc.
- Sming Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a piece of glass for measuring transmittance
- Patent number 5,776,219
- Issue date Jul 7, 1998
- Nikon Corporation
- Hiroki Jinbo
- G01 - MEASURING TESTING
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,719,698
- Issue date Feb 17, 1998
- Nikon Corporation
- Hiroyuki Hiraiwa
- G02 - OPTICS
Information Patent Grant
Silica glass
- Patent number 5,707,908
- Issue date Jan 13, 1998
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,703,712
- Issue date Dec 30, 1997
- Nikon Corporation
- Norio Komine
- G02 - OPTICS
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,702,495
- Issue date Dec 30, 1997
- Nikon Corporation
- Hiroyuki Hiraiwa
- G02 - OPTICS
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,699,183
- Issue date Dec 16, 1997
- Nikon Corporation
- Hiroyuki Hiraiwa
- G02 - OPTICS
Information Patent Grant
Automatic photography booth
- Patent number 5,696,995
- Issue date Dec 9, 1997
- Sming Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,696,624
- Issue date Dec 9, 1997
- Nikon Corporation
- Norio Komine
- G02 - OPTICS
Information Patent Grant
Method for producing silica glass for use with light in a vacuum ul...
- Patent number 5,679,125
- Issue date Oct 21, 1997
- Nikon Corporation
- Hiroyuki Hiraiwa
- C03 - GLASS MINERAL OR SLAG WOOL

Patents Applicationslast 30 patents

Information Patent Application
Production method of synthetic silica glass and thermal treatment a...
- Publication number 20040118163
- Publication date Jun 24, 2004
- Nikon Corporation
- Shouji Yajima
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Method for producing optical member
- Publication number 20040089023
- Publication date May 13, 2004
- Hiroyuki Hiraiwa
- C30 - CRYSTAL GROWTH
Information Patent Application
Optical Member for Photolithography and Method of Evaluating the Same
- Publication number 20030174300
- Publication date Sep 18, 2003
- Kazumasa Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus including silica glass for photolithography
- Publication number 20030119649
- Publication date Jun 26, 2003
- NIKON CORPORATION
- Hiroki Jinbo
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Fluorine-containing silica glass and its method of manufacture
- Publication number 20030037568
- Publication date Feb 27, 2003
- NIKON CORPORATION
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Illuminating apparatus
- Publication number 20020159142
- Publication date Oct 31, 2002
- NIKON CORPORATION
- Shigeru Hagiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Projection optical system, production method thereof, and projectio...
- Publication number 20020085176
- Publication date Jul 4, 2002
- NIKON CORPORATION
- Hiroyuki Hiraiwa
- G02 - OPTICS

Hiroyuki Hiraiwa

Person

Patents Grantslast 30 patents

Method for producing optical member

Optical member for photolithography and method of evaluating the same

Method of manufacturing silica glass member and silica glass member...

Product method of synthetic silica glass and thermal treatment appa...

Silica glass member, method for producing the same, and projection...

Projection optical system, production method thereof, and projectio...

Exposure apparatus including silica glass and method for producing...

Projection optical system, production method thereof, and projectio...

Automatic morphing photography booth

Method for producing silica glass used for photolithography

Optical member for photolithography, method for evaluating optical...

Method of making a piece of glass for measuring transmittance

Liquid material supplying apparatus and liquid material supplying m...

Illuminating apparatus

Silica glass for photolithography

Optical member for photolithography, method for evaluating optical...

Fluorine-containing silica glass

Method for producing a silica glass

Automatic photograph booth for forming sketches

Method of making a piece of glass for measuring transmittance

Silica glass member for UV-lithography, method for silica glass pro...

Silica glass

Silica glass member for UV-lithography, method for silica glass pro...

Silica glass member for UV-lithography, method for silica glass pro...

Silica glass member for UV-lithography, method for silica glass pro...

Automatic photography booth

Silica glass member for UV-lithography, method for silica glass pro...

Method for producing silica glass for use with light in a vacuum ul...

Patents Applicationslast 30 patents

Production method of synthetic silica glass and thermal treatment a...

Method for producing optical member

Optical Member for Photolithography and Method of Evaluating the Same

Exposure apparatus including silica glass for photolithography

Fluorine-containing silica glass and its method of manufacture

Illuminating apparatus

Projection optical system, production method thereof, and projectio...