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Hiroyuki Ishihara
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Nakakoma-gun, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma processing method and apparatus
Patent number
8,512,510
Issue date
Aug 20, 2013
Tokyo Electron Limited
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and method
Patent number
7,506,610
Issue date
Mar 24, 2009
Tokyo Electron Limited
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and method, and electrode plate for pla...
Patent number
7,494,561
Issue date
Feb 24, 2009
Tokyo Electron Limited
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
7,335,278
Issue date
Feb 26, 2008
Tokyo Electron AT Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of plasma processing
Patent number
7,183,219
Issue date
Feb 27, 2007
Tokyo Electron AT Limited and Japan Science and Technology Corporation
Kiichi Hama
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing device and baffle plate thereof
Patent number
7,109,660
Issue date
Sep 19, 2006
Tokyo Electron Limited
Hiroyuki Ishihara
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for plasma processing
Patent number
6,676,804
Issue date
Jan 13, 2004
Tokyo Electron AT Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
Publication number
20110214813
Publication date
Sep 8, 2011
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
Publication number
20100043974
Publication date
Feb 25, 2010
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing method and apparatus
Publication number
20060000803
Publication date
Jan 5, 2006
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing apparatus and method, and electrode plate for pla...
Publication number
20050269292
Publication date
Dec 8, 2005
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing apparatus and method
Publication number
20050257743
Publication date
Nov 24, 2005
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing apparatus and plasma processing method
Publication number
20050172904
Publication date
Aug 11, 2005
Tokyo Electron AT Limited and Japan Science and Technology Corporation
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing device and baffle plate thereof
Publication number
20050167052
Publication date
Aug 4, 2005
TOKYO ELECTRON LIMITED
Hiroyuki Ishihara
H01 - BASIC ELECTRIC ELEMENTS