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Hiroyuki Iwashita

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  • Yamanashi, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Substrate processing method and apparatus
    • Patent number 12,027,353
    • Issue date Jul 2, 2024
    • Tokyo Electron Limited
    • Shota Ishibashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Sputtering apparatus
    • Patent number 12,014,911
    • Issue date Jun 18, 2024
    • Tokyo Electron Limited
    • Shota Ishibashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Sputtering apparatus and film forming method
    • Patent number 11,742,190
    • Issue date Aug 29, 2023
    • Tokyo Electron Limited
    • Einstein Noel Abarra
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Film forming apparatus and method
    • Patent number 11,479,848
    • Issue date Oct 25, 2022
    • Tokyo Electron Limited
    • Shota Ishibashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Film forming apparatus and film forming method
    • Patent number 11,158,492
    • Issue date Oct 26, 2021
    • Tokyo Electron Limited
    • Hiroyuki Toshima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

  • Information Patent Application

    FILM FORMING APPARATUS AND FILM FORMING METHOD
    • Publication number 20220403503
    • Publication date Dec 22, 2022
    • TOKYO ELECTRON LIMITED
    • Hiroyuki Iwashita
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SPUTTERING APPARATUS AND FILM FORMING METHOD
    • Publication number 20220044920
    • Publication date Feb 10, 2022
    • TOKYO ELECTRON LIMITED
    • Einstein Noel ABARRA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SUBSTRATE PROCESSING METHOD AND APPARATUS
    • Publication number 20210305032
    • Publication date Sep 30, 2021
    • TOKYO ELECTRON LIMITED
    • Shota ISHIBASHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SPUTTERING APPARATUS
    • Publication number 20210296103
    • Publication date Sep 23, 2021
    • TOKYO ELECTRON LIMITED
    • Shota ISHIBASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    FILM FORMING APPARATUS AND METHOD
    • Publication number 20210207261
    • Publication date Jul 8, 2021
    • TOKYO ELECTRON LIMITED
    • Shota ISHIBASHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM FORMING APPARATUS AND FILM FORMING METHOD
    • Publication number 20200043711
    • Publication date Feb 6, 2020
    • TOKYO ELECTRON LIMITED
    • Hiroyuki Toshima
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...