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Hiroyuki Kohno
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Tokuyama, JP
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last 30 patents
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Patent Grant
Abrasive and method for polishing semiconductor substrate
Patent number
6,354,913
Issue date
Mar 12, 2002
Kabushiki Kaisha Toshiba
Naoto Miyashita
B24 - GRINDING POLISHING
Information
Patent Grant
Abrasive material for polishing a semiconductor wafer, and methods...
Patent number
6,045,605
Issue date
Apr 4, 2000
Kabushiki Kaisha Toshiba
Kenji Doi
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing slurries and a process for the production thereof
Patent number
5,904,159
Issue date
May 18, 1999
Tokuyama Corporation
Hiroshi Kato
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...