Hiroyuki Ogawa

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Inner wall and substrate processing apparatus
- Patent number 12,040,198
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Yuji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,328,904
- Issue date May 10, 2022
- Tokyo Electron Limited
- Shigeki Doba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,985,029
- Issue date Apr 20, 2021
- Tokyo Electron Limited
- Hiroyuki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,734,201
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Shigeki Doba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,541,145
- Issue date Jan 21, 2020
- Tokyo Electron Limited
- Hiroyuki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply method for semiconductor manufacturing apparatus, gas su...
- Patent number 9,460,895
- Issue date Oct 4, 2016
- Tokyo Electron Limited
- Hideyuki Hatoh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Inner Wall and substrate Processing Apparatus
- Publication number 20240321602
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Yuji ASAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20200321195
- Publication date Oct 8, 2020
- TOKYO ELECTRON LIMITED
- Shigeki DOBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inner Wall and substrate Processing Apparatus
- Publication number 20200203194
- Publication date Jun 25, 2020
- TOKYO ELECTRON LIMITED
- Yuji ASAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200118830
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Hiroyuki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180286696
- Publication date Oct 4, 2018
- Hiroyuki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND HEAT SHIELD PLATE
- Publication number 20180151380
- Publication date May 31, 2018
- TOKYO ELECTRON LIMITED
- Hiroyuki OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170256382
- Publication date Sep 7, 2017
- Shigeki DOBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY METHOD FOR SEMICONDUCTOR MANUFACTURING APPARATUS, GAS SU...
- Publication number 20140361102
- Publication date Dec 11, 2014
- TOKYO ELECTRON LIMITED
- Hideyuki Hatoh
- H01 - BASIC ELECTRIC ELEMENTS

Hiroyuki Ogawa

Person

Patents Grantslast 30 patents

Inner wall and substrate processing apparatus

Substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus

Substrate processing apparatus and substrate processing method

Gas supply method for semiconductor manufacturing apparatus, gas su...

Patents Applicationslast 30 patents

Inner Wall and substrate Processing Apparatus

Substrate Processing Apparatus

Inner Wall and substrate Processing Apparatus

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND HEAT SHIELD PLATE

SUBSTRATE PROCESSING APPARATUS

GAS SUPPLY METHOD FOR SEMICONDUCTOR MANUFACTURING APPARATUS, GAS SU...