Hiroyuki Ohnishi

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Kawasaki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition and color filter
- Patent number 7,858,275
- Issue date Dec 28, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Ohnishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition and color filter
- Patent number 7,740,996
- Issue date Jun 22, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Ohnishi
- G02 - OPTICS
Information Patent Grant
Method for removing resist pattern
- Patent number 7,105,265
- Issue date Sep 12, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novolak resin solution, positive photoresist composition and prepar...
- Patent number 7,060,410
- Issue date Jun 13, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Ohnishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTER
- Publication number 20090067076
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Ohnishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTER
- Publication number 20090023084
- Publication date Jan 22, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Ohnishi
- G02 - OPTICS
Information Patent Application
Method and removing resist pattern
- Publication number 20050130055
- Publication date Jun 16, 2005
- Hiroyuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novolak resin solution, positive photoresist composition and prepar...
- Publication number 20040081909
- Publication date Apr 29, 2004
- Hiroyuki Ohnishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...