Hiroyuki ONODA

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing device, and plasma processing method
- Patent number 12,020,900
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Munehito Kagaya
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20240331977
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20230033323
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20220411920
- Publication date Dec 29, 2022
- Tokyo Electron Limited
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
- Publication number 20220165544
- Publication date May 26, 2022
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- H01 - BASIC ELECTRIC ELEMENTS