Hiroyuki Shinada

Person

Chofu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Scanning electron microscope and sample observation method
- Patent number 9,991,092
- Issue date Jun 5, 2018
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and an apparatus of an inspection system using an electron beam
- Patent number 8,604,430
- Issue date Dec 10, 2013
- Hitachi, Ltd.
- Yuko Iwabuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure or system inspection or measurement apparatu...
- Patent number 8,212,227
- Issue date Jul 3, 2012
- Hitachi, Ltd.
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus of an inspection system using an electron beam
- Patent number 8,134,125
- Issue date Mar 13, 2012
- Hitachi, Ltd.
- Yuko Iwabuchi
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for wafer pattern inspection
- Patent number 7,982,188
- Issue date Jul 19, 2011
- Hitachi High-Technologies Corporation
- Hiroyuki Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspecting integrated circuit pattern
- Patent number 7,952,074
- Issue date May 31, 2011
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam exposure or system inspection or measurement apparatu...
- Patent number 7,692,144
- Issue date Apr 6, 2010
- Hitachi, Ltd.
- Masahiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and inspection system using charged particle beam
- Patent number 7,526,747
- Issue date Apr 28, 2009
- Hitachi, Ltd.
- Hidetoshi Nishiyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern inspection method and apparatus using electron beam
- Patent number 7,439,504
- Issue date Oct 21, 2008
- Hitachi, Ltd.
- Takashi Hiroi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and an apparatus of an inspection system using an electron beam
- Patent number 7,439,506
- Issue date Oct 21, 2008
- Hitachi, Ltd.
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for inspecting integrated circuit pattern
- Patent number 7,417,444
- Issue date Aug 26, 2008
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system, inspection method, and process management method
- Patent number 7,411,190
- Issue date Aug 12, 2008
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 7,397,031
- Issue date Jul 8, 2008
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus and automatic astigmatism adjustmen...
- Patent number 7,348,558
- Issue date Mar 25, 2008
- Hitachi, Ltd.
- Masahiro Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus and method with surface height calculator a...
- Patent number 7,329,889
- Issue date Feb 12, 2008
- Hitachi, Ltd.
- Masahiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting a pattern
- Patent number 7,260,256
- Issue date Aug 21, 2007
- Renesas Technology Corporation
- Takashi Hiroi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 7,242,015
- Issue date Jul 10, 2007
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method and an apparatus of an inspection system using an electron beam
- Patent number 7,232,996
- Issue date Jun 19, 2007
- Hitachi, Ltd.
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection apparatus for circuit pattern
- Patent number 7,223,975
- Issue date May 29, 2007
- Hitachi, Ltd.
- Yasuhiko Nara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection method and apparatus and semiconductor man...
- Patent number 7,122,796
- Issue date Oct 17, 2006
- Hitachi Ltd.
- Takashi Hiroi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 7,098,455
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system, inspection method, and process management method
- Patent number 7,075,076
- Issue date Jul 11, 2006
- Hitachi High-Technologies Corp.
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus and automatic astigmatism adjustmen...
- Patent number 7,030,394
- Issue date Apr 18, 2006
- Hitachi, Ltd.
- Masahiro Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting integrated circuit pattern
- Patent number 7,026,830
- Issue date Apr 11, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for wafer pattern inspection
- Patent number 7,022,986
- Issue date Apr 4, 2006
- Hitachi High-Technologies Corporation
- Hiroyuki Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and an apparatus of an inspection system using an electron beam
- Patent number 7,012,252
- Issue date Mar 14, 2006
- Hitachi, Ltd.
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and an apparatus of an inspection system using an electron beam
- Patent number 6,987,265
- Issue date Jan 17, 2006
- Hitachi, Ltd.
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 6,979,823
- Issue date Dec 27, 2005
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Pattern inspection method and apparatus using electron beam
- Patent number 6,940,069
- Issue date Sep 6, 2005
- Hitachi, Ltd.
- Takashi Hiroi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and inspection system using charged particle beam
- Patent number 6,931,620
- Issue date Aug 16, 2005
- Hitachi, Ltd.
- Hidetoshi Nishiyama
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD
- Publication number 20180269032
- Publication date Sep 20, 2018
- Zhaohui CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD
- Publication number 20120153145
- Publication date Jun 21, 2012
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND AN APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON...
- Publication number 20120132801
- Publication date May 31, 2012
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Electron Beam Exposure Or System Inspection Or Measurement Apparatu...
- Publication number 20100193686
- Publication date Aug 5, 2010
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Application
INSPECTION APPARATUS FOR CIRCUIT PATTERN
- Publication number 20100019148
- Publication date Jan 28, 2010
- Hitachi High-Technologies Corporation
- Yasuhiko Nara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION METHOD AND INSPECTION SYSTEM USING CHARGED PARTICLE BEAM
- Publication number 20090189075
- Publication date Jul 30, 2009
- Hitachi, Ltd
- Hidetoshi Nishiyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM
- Publication number 20090057556
- Publication date Mar 5, 2009
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR INSPECTING INTEGRATED CIRCUIT PATTERN
- Publication number 20080302964
- Publication date Dec 11, 2008
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Electron Beam Exposure or System Inspection Or Measurement Apparatu...
- Publication number 20080078933
- Publication date Apr 3, 2008
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Application
Inspection apparatus for circuit pattern
- Publication number 20070284526
- Publication date Dec 13, 2007
- Hitachi High-Technologies Corporation
- Yasuhiko Nara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and an apparatus of an inspection system using an electron beam
- Publication number 20070215803
- Publication date Sep 20, 2007
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Electron microscope and electron bean inspection system.
- Publication number 20070181808
- Publication date Aug 9, 2007
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam apparatus and automatic astigmatism adjustmen...
- Publication number 20060289751
- Publication date Dec 28, 2006
- Hitachi, Ltd
- Masahiro Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for wafer pattern inspection
- Publication number 20060249676
- Publication date Nov 9, 2006
- Hitachi High-Technologies Corp.
- Hiroyuki Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of inspecting a circuit pattern and inspecting instrument
- Publication number 20060243908
- Publication date Nov 2, 2006
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Inspection system, inspection method, and process management method
- Publication number 20060231758
- Publication date Oct 19, 2006
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Application
Method and an apparatus of an inspection system using an electron beam
- Publication number 20060151699
- Publication date Jul 13, 2006
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for inspecting integrated circuit pattern
- Publication number 20060043982
- Publication date Mar 2, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Patterned wafer inspection method and apparatus therefor
- Publication number 20060017014
- Publication date Jan 26, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Pattern inspection method and apparatus using electron beam
- Publication number 20050263703
- Publication date Dec 1, 2005
- Takashi Hiroi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam exposure or system inspection or measurement apparatu...
- Publication number 20050242286
- Publication date Nov 3, 2005
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Application
Inspection method and inspection system using charged particle beam
- Publication number 20050236648
- Publication date Oct 27, 2005
- Hitachi, Ltd.
- Hidetoshi Nishiyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and an apparatus of an inspection system using an electron beam
- Publication number 20050205782
- Publication date Sep 22, 2005
- Yuko Iwabuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Charged particle beam apparatus and automatic astigmatism adjustmen...
- Publication number 20050092930
- Publication date May 5, 2005
- Hitachi, Ltd. Incorporation
- Masahiro Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection method and apparatus and semiconductor man...
- Publication number 20050082476
- Publication date Apr 21, 2005
- Takashi Hiroi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system, inspection method, and process management method
- Publication number 20050051722
- Publication date Mar 10, 2005
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Application
ABSORPTION CURRENT IMAGE APPARATUS IN ELECTRON MICROSCOPE
- Publication number 20050045820
- Publication date Mar 3, 2005
- Takashi Ohshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection apparatus for circuit pattern
- Publication number 20040227079
- Publication date Nov 18, 2004
- Hitachi High-Technologies Corporation
- Yasuhiko Nara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterned wafer inspection method and apparatus therefor
- Publication number 20040222377
- Publication date Nov 11, 2004
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Electron beam exposure or system inspection or measurement apparatu...
- Publication number 20040217287
- Publication date Nov 4, 2004
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY

Hiroyuki Shinada

Person

Patents Grantslast 30 patents

Scanning electron microscope and sample observation method

Method and an apparatus of an inspection system using an electron beam

Electron beam exposure or system inspection or measurement apparatu...

Method and apparatus of an inspection system using an electron beam

Apparatus and method for wafer pattern inspection

Method and apparatus for inspecting integrated circuit pattern

Electron beam exposure or system inspection or measurement apparatu...

Inspection method and inspection system using charged particle beam

Pattern inspection method and apparatus using electron beam

Method and an apparatus of an inspection system using an electron beam

Method and apparatus for inspecting integrated circuit pattern

Inspection system, inspection method, and process management method

Method of inspecting a circuit pattern and inspecting instrument

Charged particle beam apparatus and automatic astigmatism adjustmen...

Electron beam apparatus and method with surface height calculator a...

Method and system for inspecting a pattern

Patterned wafer inspection method and apparatus therefor

Method and an apparatus of an inspection system using an electron beam

Inspection apparatus for circuit pattern

Electron beam inspection method and apparatus and semiconductor man...

Method of inspecting a circuit pattern and inspecting instrument

Inspection system, inspection method, and process management method

Charged particle beam apparatus and automatic astigmatism adjustmen...

Method and apparatus for inspecting integrated circuit pattern

Apparatus and method for wafer pattern inspection

Method and an apparatus of an inspection system using an electron beam

Method and an apparatus of an inspection system using an electron beam

Patterned wafer inspection method and apparatus therefor

Pattern inspection method and apparatus using electron beam

Inspection method and inspection system using charged particle beam

Patents Applicationslast 30 patents

SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD

SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD

METHOD AND AN APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON...

Electron Beam Exposure Or System Inspection Or Measurement Apparatu...

INSPECTION APPARATUS FOR CIRCUIT PATTERN

INSPECTION METHOD AND INSPECTION SYSTEM USING CHARGED PARTICLE BEAM

METHOD AND APPARATUS OF AN INSPECTION SYSTEM USING AN ELECTRON BEAM

METHOD AND APPARATUS FOR INSPECTING INTEGRATED CIRCUIT PATTERN

Electron Beam Exposure or System Inspection Or Measurement Apparatu...

Inspection apparatus for circuit pattern

Method and an apparatus of an inspection system using an electron beam

Electron microscope and electron bean inspection system.

Charged particle beam apparatus and automatic astigmatism adjustmen...

Apparatus and method for wafer pattern inspection

Method of inspecting a circuit pattern and inspecting instrument

Inspection system, inspection method, and process management method

Method and an apparatus of an inspection system using an electron beam

Method and apparatus for inspecting integrated circuit pattern

Patterned wafer inspection method and apparatus therefor

Pattern inspection method and apparatus using electron beam

Electron beam exposure or system inspection or measurement apparatu...

Inspection method and inspection system using charged particle beam

Method and an apparatus of an inspection system using an electron beam

Charged particle beam apparatus and automatic astigmatism adjustmen...

Electron beam inspection method and apparatus and semiconductor man...

Inspection system, inspection method, and process management method

ABSORPTION CURRENT IMAGE APPARATUS IN ELECTRON MICROSCOPE

Inspection apparatus for circuit pattern

Patterned wafer inspection method and apparatus therefor

Electron beam exposure or system inspection or measurement apparatu...