Hiroyuki Takaba

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method for substrate to be processed and plasma-etching device
- Patent number 9,721,803
- Issue date Aug 1, 2017
- Tokyo Electron Limited
- Hiroyuki Takaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching organic film and plasma etching device
- Patent number 9,293,346
- Issue date Mar 22, 2016
- Tokyo Electron Limited
- Hiroyuki Takaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment method
- Patent number 8,778,810
- Issue date Jul 15, 2014
- Tokyo Electron Limited
- Hiroyuki Takaba
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of depositing highly conformal amorphous carbon films over r...
- Patent number 8,399,366
- Issue date Mar 19, 2013
- Tokyo Electron Limited
- Hiroyuki Takaba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 7,820,503
- Issue date Oct 26, 2010
- Renesas Electronics Corporation
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 7,511,338
- Issue date Mar 31, 2009
- Renesas Technology Corp.
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150294839
- Publication date Oct 15, 2015
- TOKYO ELECTRON LIMITED
- Hiroyuki TAKABA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD FOR SUBSTRATE TO BE PROCESSED AND PLASMA-ETCHING DEVICE
- Publication number 20150118858
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Hiroyuki Takaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING ORGANIC FILM AND PLASMA ETCHING DEVICE
- Publication number 20150064924
- Publication date Mar 5, 2015
- TOKYO ELECTRON LIMITED
- Hiroyuki Takaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITING HIGHLY CONFORMAL AMORPHOUS CARBON FILMS OVER R...
- Publication number 20130052808
- Publication date Feb 28, 2013
- TOKYO ELECTRON LIMITED
- Hiroyuki Takaba
- B82 - NANO-TECHNOLOGY
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20130034970
- Publication date Feb 7, 2013
- TOKYO ELECTRON LIMITED
- Hiroyuki Takaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TREATMENT METHOD
- Publication number 20120098147
- Publication date Apr 26, 2012
- TOKYO ELECTRON LIMITED
- Hiroyuki Takaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20080293229
- Publication date Nov 27, 2008
- RENESAS TECHNOLOGY CORP.
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20070096157
- Publication date May 3, 2007
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film forming method and fabrication process of semiconductor device
- Publication number 20070054503
- Publication date Mar 8, 2007
- TOKYO ELECTRON LIMITED
- Hiroyuki Takaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hiroyuki Takaba

Person

Patents Grantslast 30 patents

Etching method for substrate to be processed and plasma-etching device

Method for etching organic film and plasma etching device

Plasma treatment method

Method of depositing highly conformal amorphous carbon films over r...

Semiconductor device and manufacturing method of the same

Semiconductor device and manufacturing method of the same

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ETCHING METHOD FOR SUBSTRATE TO BE PROCESSED AND PLASMA-ETCHING DEVICE

METHOD FOR ETCHING ORGANIC FILM AND PLASMA ETCHING DEVICE

METHOD OF DEPOSITING HIGHLY CONFORMAL AMORPHOUS CARBON FILMS OVER R...

PLASMA PROCESSING METHOD

PLASMA TREATMENT METHOD

Semiconductor device and manufacturing method of the same

Semiconductor device and manufacturing method of the same

Film forming method and fabrication process of semiconductor device