Hiroyuki Takahashi

Person

North Andover, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,383,517
- Issue date Feb 26, 2013
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput chemical treatment system and method of operating
- Patent number 8,323,410
- Issue date Dec 4, 2012
- Tokyo Electron Limited
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support for high throughput chemical treatment system
- Patent number 8,287,688
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching metal nitride with high selectivity to other mat...
- Patent number 8,282,844
- Issue date Oct 9, 2012
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,198,197
- Issue date Jun 12, 2012
- Tokyo Electron Limited
- Yosuke Sakao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust assembly for a plasma processing system
- Patent number 8,012,305
- Issue date Sep 6, 2011
- Tokyo Electron Limited
- Hiroyuki Takahashi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and system for performing a chemical oxide removal process
- Patent number 7,877,161
- Issue date Jan 25, 2011
- Tokyo Electron Limited
- Masayuki Tomoyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for dry etching a metal nitride
- Patent number 7,815,814
- Issue date Oct 19, 2010
- Tokyo Electron Limited
- Hiroyuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust assembly for plasma processing system and method
- Patent number 7,416,677
- Issue date Aug 26, 2008
- Tokyo Electron Limited
- Hiroyuki Takahashi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT FOR HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM
- Publication number 20100024981
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM AND METHOD OF OPERATING
- Publication number 20100025367
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20090233446
- Publication date Sep 17, 2009
- TOKYO ELECTRON LIMITED
- Yosuke Sakao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching metal nitride with high selectivity to other mat...
- Publication number 20090032495
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Akiteru KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST ASSEMBLY FOR A PLASMA PROCESSING SYSTEM
- Publication number 20080295964
- Publication date Dec 4, 2008
- TOKYO ELECTRON LIMITED
- Hiroyuki Takahashi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
METHOD AND SYSTEM FOR DRY ETCHING A METAL NITRIDE
- Publication number 20080230519
- Publication date Sep 25, 2008
- TOKYO ELECTRON LIMITED
- Hiroyuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20080182421
- Publication date Jul 31, 2008
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exhaust Assembly for Plasma Processing System and Method
- Publication number 20080035605
- Publication date Feb 14, 2008
- TOKYO ELECTRON LIMITED
- Hiroyuki Takahashi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Processing system and method for treating a substrate
- Publication number 20050227494
- Publication date Oct 13, 2005
- TOKYO ELECTRON LIMITED
- Fumihiko Higuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of operating a system for chemical oxide removal
- Publication number 20040185583
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Masayuki Tomoyasu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Hiroyuki Takahashi

Person

Patents Grantslast 30 patents

Substrate processing method and substrate processing apparatus

High throughput chemical treatment system and method of operating

Substrate support for high throughput chemical treatment system

Method for etching metal nitride with high selectivity to other mat...

Plasma etching method

Exhaust assembly for a plasma processing system

Method and system for performing a chemical oxide removal process

Method and system for dry etching a metal nitride

Exhaust assembly for plasma processing system and method

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT FOR HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM

HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM AND METHOD OF OPERATING

Plasma etching method

Method for etching metal nitride with high selectivity to other mat...

EXHAUST ASSEMBLY FOR A PLASMA PROCESSING SYSTEM

METHOD AND SYSTEM FOR DRY ETCHING A METAL NITRIDE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Exhaust Assembly for Plasma Processing System and Method

Processing system and method for treating a substrate

Method of operating a system for chemical oxide removal