Hiroyuki WAKAYAMA

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film-forming composition and method for forming r...
- Patent number 12,072,631
- Issue date Aug 27, 2024
- NISSAN CHEMICAL CORPORATION
- Shou Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming block copolymer layer for formation of micr...
- Patent number 12,030,974
- Issue date Jul 9, 2024
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silicon-containing resist underlayer film r...
- Patent number 11,815,815
- Issue date Nov 14, 2023
- Nissan Chemical Industries, Ltd.
- Hiroyuki Wakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming underlayer film of self-assembled film incl...
- Patent number 11,674,053
- Issue date Jun 13, 2023
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing semiconductor device using silicon-contain...
- Patent number 11,488,824
- Issue date Nov 1, 2022
- Nissan Chemical Industries, Ltd.
- Satoshi Takeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Underlayer film-forming composition for use in forming a microphase...
- Patent number 11,440,985
- Issue date Sep 13, 2022
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,022,884
- Issue date Jun 1, 2021
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Self-organized film-forming composition for use in forming a micro-...
- Patent number 10,995,172
- Issue date May 4, 2021
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper-layer film forming composition and method for producing a pha...
- Patent number 10,865,262
- Issue date Dec 15, 2020
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- B32 - LAYERED PRODUCTS
Information Patent Grant
Film-forming composition containing silicone having crosslinking re...
- Patent number 10,845,703
- Issue date Nov 24, 2020
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Bottom layer film-formation composition of self-organizing film con...
- Patent number 10,508,181
- Issue date Dec 17, 2019
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 10,372,039
- Issue date Aug 6, 2019
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bottom layer film-forming composition of self-organizing film conta...
- Patent number 10,280,328
- Issue date May 7, 2019
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coating composition for pattern reversal on soc pattern
- Patent number 10,139,729
- Issue date Nov 27, 2018
- Nissan Chemical Industries, Ltd.
- Hiroaki Yaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 10,082,735
- Issue date Sep 25, 2018
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing silicon conta...
- Patent number 10,079,146
- Issue date Sep 18, 2018
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Underlayer film-forming composition for self-assembled films
- Patent number 10,000,664
- Issue date Jun 19, 2018
- Nissan Chemical Industries, Ltd.
- Hiroyuki Wakayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-containing resist underlayer film-forming composition contain...
- Patent number 9,725,618
- Issue date Aug 8, 2017
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 9,494,862
- Issue date Nov 15, 2016
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ACID CATALYST...
- Publication number 20240310730
- Publication date Sep 19, 2024
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING PROTECTED BAS...
- Publication number 20240184204
- Publication date Jun 6, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroyuki WAKAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER
- Publication number 20230287165
- Publication date Sep 14, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20230060697
- Publication date Mar 2, 2023
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ALICYCLIC COM...
- Publication number 20220187707
- Publication date Jun 16, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroyuki WAKAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING R...
- Publication number 20210397090
- Publication date Dec 23, 2021
- NISSAN CHEMICAL CORPORATION
- Shou SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING BLOCK COPOLYMER LAYER FOR FORMATION OF MICR...
- Publication number 20210284782
- Publication date Sep 16, 2021
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ORGANIZED FILM-FORMING COMPOSITION FOR USE IN FORMING A MICRO-...
- Publication number 20200123298
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
UNDERLAYER FILM-FORMING COMPOSITION FOR USE IN FORMING A MICROPHASE...
- Publication number 20190359749
- Publication date Nov 28, 2019
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
UPPER-LAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING A PHA...
- Publication number 20190233559
- Publication date Aug 1, 2019
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING RE...
- Publication number 20180335698
- Publication date Nov 22, 2018
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM R...
- Publication number 20170371242
- Publication date Dec 28, 2017
- Nissan Chemical Industries, Ltd.
- Hiroyuki WAKAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COATING COMPOSITION FOR PATTERN REVERSAL ON SOC PATTERN
- Publication number 20170271151
- Publication date Sep 21, 2017
- Nissan Chemical Industries, Ltd.
- Hiroaki YAGUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...
- Publication number 20170168397
- Publication date Jun 15, 2017
- Nissan Chemical Industries, Ltd.
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...
- Publication number 20170153549
- Publication date Jun 1, 2017
- Nissan Chemical Industries, Ltd.
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAIN...
- Publication number 20160251546
- Publication date Sep 1, 2016
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FORMING UNDERLAYER FILM OF SELF-ASSEMBLED FILM INCLUDING ALIPHATIC...
- Publication number 20160222248
- Publication date Aug 4, 2016
- Nissan Chemical Industries, Ltd.
- Takafumi ENDO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CON...
- Publication number 20150322219
- Publication date Nov 12, 2015
- Nissan Chemical Industries, Ltd.
- Yasunobu SOMEYA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVIN...
- Publication number 20150316849
- Publication date Nov 5, 2015
- Yuta KANNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM LAYER FILM-FORMING COMPOSITION OF SELF-ORGANIZING FILM CONTA...
- Publication number 20150315402
- Publication date Nov 5, 2015
- Nissan Chemical Industries, Ltd.
- Yasunobu SOMEYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON CONTA...
- Publication number 20150249012
- Publication date Sep 3, 2015
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVIN...
- Publication number 20150159045
- Publication date Jun 11, 2015
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
UNDERLAYER FILM-FORMING COMPOSITION FOR SELF-ASSEMBLED FILMS
- Publication number 20150118396
- Publication date Apr 30, 2015
- Nissan Chemical Industries, Ltd.
- Hiroyuki Wakayama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SILICON-CONTAIN...
- Publication number 20140377957
- Publication date Dec 25, 2014
- Satoshi Takeda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Hiroyuki WAKAYAMA

Person

Patents Grantslast 30 patents

Resist underlayer film-forming composition and method for forming r...

Composition for forming block copolymer layer for formation of micr...

Composition for forming silicon-containing resist underlayer film r...

Composition for forming underlayer film of self-assembled film incl...

Method for manufacturing semiconductor device using silicon-contain...

Underlayer film-forming composition for use in forming a microphase...

Silicon-containing resist underlayer film-forming composition havin...

Self-organized film-forming composition for use in forming a micro-...

Upper-layer film forming composition and method for producing a pha...

Film-forming composition containing silicone having crosslinking re...

Bottom layer film-formation composition of self-organizing film con...

Resist underlayer film forming composition containing silicon havin...

Bottom layer film-forming composition of self-organizing film conta...

Coating composition for pattern reversal on soc pattern

Silicon-containing resist underlayer film-forming composition havin...

Resist underlayer film forming composition containing silicon conta...

Underlayer film-forming composition for self-assembled films

Metal-containing resist underlayer film-forming composition contain...

Resist underlayer film forming composition containing silicon havin...

Patents Applicationslast 30 patents

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ACID CATALYST...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING PROTECTED BAS...

VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER

EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ALICYCLIC COM...

RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING R...

COMPOSITION FOR FORMING BLOCK COPOLYMER LAYER FOR FORMATION OF MICR...

SELF-ORGANIZED FILM-FORMING COMPOSITION FOR USE IN FORMING A MICRO-...

UNDERLAYER FILM-FORMING COMPOSITION FOR USE IN FORMING A MICROPHASE...

UPPER-LAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING A PHA...

FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING RE...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM R...

COATING COMPOSITION FOR PATTERN REVERSAL ON SOC PATTERN

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...

METAL-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAIN...

FORMING UNDERLAYER FILM OF SELF-ASSEMBLED FILM INCLUDING ALIPHATIC...

BOTTOM LAYER FILM-FORMATION COMPOSITION OF SELF-ORGANIZING FILM CON...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVIN...

BOTTOM LAYER FILM-FORMING COMPOSITION OF SELF-ORGANIZING FILM CONTA...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON CONTA...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVIN...

UNDERLAYER FILM-FORMING COMPOSITION FOR SELF-ASSEMBLED FILMS

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SILICON-CONTAIN...