Hiroyuki Yamazaki

Person

Koza-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 6,063,953
- Issue date May 16, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 6,022,666
- Issue date Feb 8, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-sensitization photoresist composition
- Patent number 5,990,338
- Issue date Nov 23, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working chemical-sensitization photoresist composition
- Patent number 5,973,187
- Issue date Oct 26, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical-amplification-type negative resist composition and method...
- Patent number 5,955,241
- Issue date Sep 21, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-sensitization photoresist composition com...
- Patent number 5,928,837
- Issue date Jul 27, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 5,902,713
- Issue date May 11, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method with selective silylation utilizing lithogra...
- Patent number 5,599,653
- Issue date Feb 4, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic double-coated patterning plate with undercoat levellin...
- Patent number 5,498,514
- Issue date Mar 12, 1996
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiroyuki Yamazaki

Person

Patents Grantslast 30 patents

Chemical-sensitization photoresist composition

Chemical-sensitization photoresist composition

Negative-working chemical-sensitization photoresist composition

Positive-working chemical-sensitization photoresist composition

Chemical-amplification-type negative resist composition and method...

Negative-working chemical-sensitization photoresist composition com...

Chemical-sensitization photoresist composition

Pattern forming method with selective silylation utilizing lithogra...

Lithographic double-coated patterning plate with undercoat levellin...