Hisaharu Obinata

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Hatano, JP

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Patents Grantslast 30 patents

Information Patent Grant
Composite sputtering cathode assembly and sputtering apparatus with...
- Patent number 6,290,826
- Issue date Sep 18, 2001
- Nihon Shinku Gijutsu Kabushiki Kaisha
- Hisaharu Obinata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Small size sputtering target and high vacuum sputtering apparatus u...
- Patent number 5,753,090
- Issue date May 19, 1998
- Nihon Shinku Gijutsu Kabushiki Kaisha
- Hisaharu Obinata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum deposition using pressurized reflow process
- Patent number 5,011,793
- Issue date Apr 30, 1991
- Nihon Shinku Gijutsu Kabushiki Kaisha
- Hisaharu Obinata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter etching apparatus having a second electrically floating ele...
- Patent number 4,624,767
- Issue date Nov 25, 1986
- Nihon Shinku Gijutsu Kabushiki Kaisha
- Hisaharu Obinata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...