Hisanobu Harada

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition and method of forming pattern
- Patent number 8,216,763
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern
- Patent number 8,178,284
- Issue date May 15, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Kohno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermoacid generator for antireflection film formation, composition...
- Patent number 7,785,768
- Issue date Aug 31, 2010
- Tokyo Ohka Kogyo Co. Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist coating solution comprising a mixed solvent of...
- Patent number 5,702,862
- Issue date Dec 30, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Hayato Ohno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20090280438
- Publication date Nov 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Kohno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN
- Publication number 20090220889
- Publication date Sep 3, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermoacid Generator for Antireflection Film Formation, Composition...
- Publication number 20090130595
- Publication date May 21, 2009
- TOKYO OHKA KOGYO CO., LTD.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAY...
- Publication number 20080312400
- Publication date Dec 18, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki YAMASHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for formation of antireflection film, and antireflectio...
- Publication number 20060292488
- Publication date Dec 28, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Takayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming intermediate layer containing sylylphenylen...
- Publication number 20060263702
- Publication date Nov 23, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Yamashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hisanobu Harada

Person

Patents Grantslast 30 patents

Photosensitive resin composition and method of forming pattern

Method of forming pattern

Thermoacid generator for antireflection film formation, composition...

Positive photoresist coating solution comprising a mixed solvent of...

Patents Applicationslast 30 patents

METHOD OF FORMING PATTERN

PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN

Thermoacid Generator for Antireflection Film Formation, Composition...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAY...

Composition for formation of antireflection film, and antireflectio...

Composition for forming intermediate layer containing sylylphenylen...