Hisao Nishizawa

Person

Inugami, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of and an apparatus for processing a substrate
- Patent number 5,888,344
- Issue date Mar 30, 1999
- Dainippon Screen Mfg. Co., Ltd.
- Nobutoshi Ogami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder
- Patent number 5,704,493
- Issue date Jan 6, 1998
- Dainippon Screen Mfg. Co., Ltd.
- Kazunori Fujikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning method and apparatus therefore
- Patent number 5,288,333
- Issue date Feb 22, 1994
- Dainippon Screen Mfg. Co., Ltd.
- Masato Tanaka
- B08 - CLEANING
Information Patent Grant
Apparatus and system for treating surface of a wafer by dipping the...
- Patent number 5,275,184
- Issue date Jan 4, 1994
- Dainippon Screen Mfg. Co., Ltd.
- Hisao Nishizawa
- B08 - CLEANING
Information Patent Grant
Wafer cleaning method and apparatus therefor
- Patent number 5,158,100
- Issue date Oct 27, 1992
- Dainippon Screen Mfg. Co., Ltd.
- Masato Tanaka
- B08 - CLEANING
Information Patent Grant
Method and apparatus for surface treating of substrates
- Patent number 4,871,417
- Issue date Oct 3, 1989
- Dainippon Screen Mfg. Co., Ltd.
- Hisao Nishizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for washing opposite surfaces of a substrate
- Patent number 4,811,443
- Issue date Mar 14, 1989
- Dainippon Screen Mfg. Co., Ltd.
- Hisao Nishizawa
- B08 - CLEANING
Information Patent Grant
Method of surface treatment
- Patent number 4,569,717
- Issue date Feb 11, 1986
- Dainippon Screen Mfg. Co., Ltd.
- Nobutoshi Ohgami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Substrate holding apparatus
- Publication number 20030178379
- Publication date Sep 25, 2003
- Dainippon Screen Mfg. Co., Ltd.
- Koji Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS

Hisao Nishizawa

Person

Patents Grantslast 30 patents

Method of and an apparatus for processing a substrate

Substrate holder

Wafer cleaning method and apparatus therefore

Apparatus and system for treating surface of a wafer by dipping the...

Wafer cleaning method and apparatus therefor

Method and apparatus for surface treating of substrates

Apparatus for washing opposite surfaces of a substrate

Method of surface treatment

Patents Applicationslast 30 patents

Substrate holding apparatus