Hisashi Matsumura

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Osaka, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating semiconductor thin film using substrate irra...
- Patent number 8,673,748
- Issue date Mar 18, 2014
- Osaka University
- Hisashi Matsumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR THIN FILM USING SUBSTRATE IRRA...
- Publication number 20120001302
- Publication date Jan 5, 2012
- OSAKA UNIVERSITY
- Hisashi Matsumura
- C30 - CRYSTAL GROWTH