Hisashi NAKAGAWA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive composition and resist pattern-forming method
- Patent number 11,506,976
- Issue date Nov 22, 2022
- JSR Corporation
- Hisashi Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition, pattern-forming method, and metal-...
- Patent number 11,079,676
- Issue date Aug 3, 2021
- JSR Corporation
- Yusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method
- Patent number 10,725,376
- Issue date Jul 28, 2020
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 10,520,815
- Issue date Dec 31, 2019
- JSR Corporation
- Takehiko Naruoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition and method of forming pattern using composition
- Patent number 10,209,619
- Issue date Feb 19, 2019
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist material and resist pattern-forming method
- Patent number 10,120,282
- Issue date Nov 6, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inorganic film-forming composition for multilayer resist processes,...
- Patent number 10,090,163
- Issue date Oct 2, 2018
- JSR Corporation
- Hisashi Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist-pattern-forming method and chemically amplified resist material
- Patent number 10,073,348
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material, pattern-forming method, compo...
- Patent number 10,073,349
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material and resist pattern-forming method
- Patent number 10,018,911
- Issue date Jul 10, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist material and resist pattern-forming method
- Patent number 9,989,849
- Issue date Jun 5, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,971,247
- Issue date May 15, 2018
- Osaka University
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 9,939,729
- Issue date Apr 10, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing substrate with metal body
- Patent number 9,150,962
- Issue date Oct 6, 2015
- JSR Corporation
- Tatsuya Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition for forming aluminum-containing film, and method for fo...
- Patent number 9,080,065
- Issue date Jul 14, 2015
- JSR Corporation
- Hisashi Nakagawa
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Polymer and process for producing the same, composition for forming...
- Patent number 8,404,786
- Issue date Mar 26, 2013
- JSR Corporation
- Masahiro Akiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for forming organic silica film, organic silica film, wiring...
- Patent number 8,268,403
- Issue date Sep 18, 2012
- JSR Corporation
- Masahiro Akiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polycarbosilane, method for producing same, silica composition for...
- Patent number 8,017,700
- Issue date Sep 13, 2011
- JSR Corporation
- Hisashi Nakagawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Organic silica film and method for forming same, composition for fo...
- Patent number 7,893,538
- Issue date Feb 22, 2011
- JSR Corporation
- Hisashi Nakagawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming insulating film, method for producing same,...
- Patent number 7,875,317
- Issue date Jan 25, 2011
- JSR Corporation
- Hisashi Nakagawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Insulating-film-forming composition, method of producing the same,...
- Patent number 7,736,748
- Issue date Jun 15, 2010
- JSR Corporation
- Masahiro Akiyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing polymer, polymer, composition for forming insu...
- Patent number 7,528,207
- Issue date May 5, 2009
- JSR Corporation
- Hisashi Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polycarbosilane and method of producing the same
- Patent number 7,358,317
- Issue date Apr 15, 2008
- JSR Corporation
- Hisashi Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20200356000
- Publication date Nov 12, 2020
- JSR Corporation
- Shinya MINEGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20200166840
- Publication date May 28, 2020
- JSR Corporation
- Hisashi Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20200041898
- Publication date Feb 6, 2020
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...
- Publication number 20200041902
- Publication date Feb 6, 2020
- JSR Corporation
- Tomoki NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20200004144
- Publication date Jan 2, 2020
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20190354010
- Publication date Nov 21, 2019
- JSR Corporation
- Shinya MINEGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND METAL O...
- Publication number 20190310551
- Publication date Oct 10, 2019
- JSR Corporation
- Shinya MINEGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METAL-...
- Publication number 20190310552
- Publication date Oct 10, 2019
- JSR Corporation
- Yusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...
- Publication number 20180267406
- Publication date Sep 20, 2018
- JSR Corporation
- Tomoki NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20180017864
- Publication date Jan 18, 2018
- JSR Corporation
- Takehiko NARUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20170362412
- Publication date Dec 21, 2017
- JSR Corporation
- Shunsuke KURITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20170299962
- Publication date Oct 19, 2017
- JSR Corporation
- Motohiro SHIRATANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITI...
- Publication number 20170269476
- Publication date Sep 21, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170184960
- Publication date Jun 29, 2017
- JSR Corporation
- Takehiko NARUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170184961
- Publication date Jun 29, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD
- Publication number 20170131634
- Publication date May 11, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD
- Publication number 20170131633
- Publication date May 11, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD
- Publication number 20170075221
- Publication date Mar 16, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20170075224
- Publication date Mar 16, 2017
- JSR Corporation
- Hisashi Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SE...
- Publication number 20170059992
- Publication date Mar 2, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170052450
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL
- Publication number 20170052448
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...
- Publication number 20170052449
- Publication date Feb 23, 2017
- Osaka University
- HISASHI NAKAGAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR DEVICE PRODUCTION COMPOSITION AND PATTERN FORMATION M...
- Publication number 20160349616
- Publication date Dec 1, 2016
- JSR Corporation
- Hisashi NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20160187777
- Publication date Jun 30, 2016
- JSR Corporation
- Hisashi NAKAGAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES,...
- Publication number 20150364332
- Publication date Dec 17, 2015
- JSR Corporation
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150284539
- Publication date Oct 8, 2015
- JSR Corporation
- Shunsuke KURITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH METAL BODY
- Publication number 20140134331
- Publication date May 15, 2014
- JSR Corporation
- Tatsuya SAKAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION FOR FORMING ALUMINUM-CONTAINING FILM, AND METHOD FOR FO...
- Publication number 20130230666
- Publication date Sep 5, 2013
- JSR Corporation
- Hisashi NAKAGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATI...
- Publication number 20110042789
- Publication date Feb 24, 2011
- JSR Corporation
- Hisashi Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hisashi NAKAGAWA

Person

Patents Grantslast 30 patents

Radiation-sensitive composition and resist pattern-forming method

Radiation-sensitive composition, pattern-forming method, and metal-...

Pattern-forming method

Pattern-forming method

Composition and method of forming pattern using composition

Chemically amplified resist material and resist pattern-forming method

Inorganic film-forming composition for multilayer resist processes,...

Resist-pattern-forming method and chemically amplified resist material

Chemically amplified resist material, pattern-forming method, compo...

Chemically amplified resist material and resist pattern-forming method

Chemically amplified resist material and resist pattern-forming method

Pattern-forming method

Resist pattern-forming method

Method for producing substrate with metal body

Composition for forming aluminum-containing film, and method for fo...

Polymer and process for producing the same, composition for forming...

Method for forming organic silica film, organic silica film, wiring...

Polycarbosilane, method for producing same, silica composition for...

Organic silica film and method for forming same, composition for fo...

Composition for forming insulating film, method for producing same,...

Insulating-film-forming composition, method of producing the same,...

Method for producing polymer, polymer, composition for forming insu...

Polycarbosilane and method of producing the same

Patents Applicationslast 30 patents

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND METAL O...

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METAL-...

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...

PATTERN-FORMING METHOD

COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITI...

PATTERN-FORMING METHOD

PATTERN-FORMING METHOD

CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SE...

PATTERN-FORMING METHOD

RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL

CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...

SEMICONDUCTOR DEVICE PRODUCTION COMPOSITION AND PATTERN FORMATION M...

COMPOSITION AND PATTERN-FORMING METHOD

INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES,...

COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD

METHOD FOR PRODUCING SUBSTRATE WITH METAL BODY

COMPOSITION FOR FORMING ALUMINUM-CONTAINING FILM, AND METHOD FOR FO...

MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATI...