Hisashi Nakane

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive-working photoresist containing o-naphthoquinone diazide su...
- Patent number 5,281,508
- Issue date Jan 25, 1994
- Tokyo Ohka Kogyo Co., Ltd.
- Hidekatsu Kohara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Remover solution for photoresist
- Patent number 4,904,571
- Issue date Feb 27, 1990
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Miyashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating material for photosensitive resins
- Patent number 4,902,770
- Issue date Feb 20, 1990
- Tokyo Ohka Kogyo Co., Ltd.
- Wataru Ishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Containing an arylsulfonic acid, a phenol and a naphalenic solvent
- Patent number 4,844,832
- Issue date Jul 4, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Masakazu Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing solution for positive-working photoresist comprising tma...
- Patent number 4,833,067
- Issue date May 23, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Hatsuyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a positive resist pattern in photoresist of o-nap...
- Patent number 4,797,348
- Issue date Jan 10, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing solution for positive-working photoresist comprising a m...
- Patent number 4,784,937
- Issue date Nov 15, 1988
- Tokyo Ohka Kogyo Co., Ltd.
- Hatsuyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working O-quinone diazide photoresist composition with 2,3...
- Patent number 4,738,915
- Issue date Apr 19, 1988
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photosensitive composition comprising a diphenylam...
- Patent number 4,737,438
- Issue date Apr 12, 1988
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomasks for photolithographic fine patterning
- Patent number 4,735,890
- Issue date Apr 5, 1988
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Hisashi Nakane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preparing photoresist material with undercoating of photo...
- Patent number 4,702,992
- Issue date Oct 27, 1987
- Tokyo Ohka Kogyo Co., Ltd.
- Wataru Ishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid composition for forming a coating film of organopolysiloxane...
- Patent number 4,694,040
- Issue date Sep 15, 1987
- Tokyo Denshi Kagaku Kabushiki Kaisha
- Akira Hashimoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Wafer holding frame
- Patent number D291413
- Issue date Aug 18, 1987
- Tokyo Denshi Kagaku Co., Ltd.
- Akira Uehara
- D09 - Packages and containers for goods
Information Patent Grant
Aqueous developer solution for positive type photoresists with tetr...
- Patent number 4,610,953
- Issue date Sep 9, 1986
- Tokyo Ohka Kogyo Co., Ltd.
- Koichiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fine pattern formation on a photoresist
- Patent number 4,590,149
- Issue date May 20, 1986
- Tokyo Ohka Kogyo Co., Ltd.
- Hisashi Nakane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fine pattern formation on a photoresist
- Patent number 4,588,675
- Issue date May 13, 1986
- Tok Yo Ohka Kogyo Co., Ltd.
- Hisashi Nakane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma etching method
- Patent number 4,578,559
- Issue date Mar 25, 1986
- Tokyo Ohka Kogyo Co., Ltd.
- Isamu Hijikata
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for providing a pattern-wise photoresist layer on a substrat...
- Patent number 4,557,996
- Issue date Dec 10, 1985
- Photopoly Ohka Co., Ltd.
- Toshimi Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automatic plasma processing device and heat treatment device
- Patent number 4,550,239
- Issue date Oct 29, 1985
- Tokyo Denshi Kagaku Kabushiki Kaisha
- Akira Uehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automatic plasma processing device and heat treatment device for ba...
- Patent number 4,550,242
- Issue date Oct 29, 1985
- Tokyo Denshi Kagaku Kabushiki Kaisha
- Akira Uehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automatic apparatus for continuous treatment of leaf materials with...
- Patent number 4,483,651
- Issue date Nov 20, 1984
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Hisashi Nakane
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Method for pattern-wise etching of a metallic coating film
- Patent number 4,474,642
- Issue date Oct 2, 1984
- Tokyo Denshi Kagaku Co., Ltd.
- Hisashi Nakane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dry etching of a substrate surface
- Patent number 4,465,553
- Issue date Aug 14, 1984
- Tokyo Denshi Kagaku Co., Ltd.
- Isamu Hijikata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and process for ultra-fine pattern formation
- Patent number 4,401,745
- Issue date Aug 30, 1983
- Tokyo Ohka Kogyo Co., Ltd.
- Hisashi Nakane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preventing leaching of contaminants from solid surfaces
- Patent number 4,385,086
- Issue date May 24, 1983
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Muneo Nakayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for automatic semi-batch sheet treatment of semiconductor...
- Patent number 4,336,438
- Issue date Jun 22, 1982
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Akira Uehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for the treatment of semiconductor wafers by plasma reaction
- Patent number 4,318,767
- Issue date Mar 9, 1982
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Isamu Hijikata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid compositions for forming silica coating films
- Patent number 4,277,525
- Issue date Jul 7, 1981
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Muneo Nakayama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Liquid coating composition for forming transparent conductive films...
- Patent number 4,268,539
- Issue date May 19, 1981
- Tokyo Denshi Kagaku Kabushiki Kaisha
- Muneo Nakayama
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Apparatus for treatment with gas plasma
- Patent number 4,245,154
- Issue date Jan 13, 1981
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Akira Uehara
- H01 - BASIC ELECTRIC ELEMENTS

Hisashi Nakane

Person

Patents Grantslast 30 patents

Positive-working photoresist containing o-naphthoquinone diazide su...

Remover solution for photoresist

Undercoating material for photosensitive resins

Containing an arylsulfonic acid, a phenol and a naphalenic solvent

Developing solution for positive-working photoresist comprising tma...

Method of forming a positive resist pattern in photoresist of o-nap...

Developing solution for positive-working photoresist comprising a m...

Positive-working O-quinone diazide photoresist composition with 2,3...

Negative-working photosensitive composition comprising a diphenylam...

Photomasks for photolithographic fine patterning

Method of preparing photoresist material with undercoating of photo...

Liquid composition for forming a coating film of organopolysiloxane...

Wafer holding frame

Aqueous developer solution for positive type photoresists with tetr...

Method for fine pattern formation on a photoresist

Method for fine pattern formation on a photoresist

Plasma etching method

Method for providing a pattern-wise photoresist layer on a substrat...

Automatic plasma processing device and heat treatment device

Automatic plasma processing device and heat treatment device for ba...

Automatic apparatus for continuous treatment of leaf materials with...

Method for pattern-wise etching of a metallic coating film

Method for dry etching of a substrate surface

Composition and process for ultra-fine pattern formation

Method for preventing leaching of contaminants from solid surfaces

Apparatus for automatic semi-batch sheet treatment of semiconductor...

Apparatus for the treatment of semiconductor wafers by plasma reaction

Liquid compositions for forming silica coating films

Liquid coating composition for forming transparent conductive films...

Apparatus for treatment with gas plasma