Hisataka HAYASHI

Person

Yokohoma-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method, semiconductor manufacturing apparatus, and method o...
- Patent number 11,651,969
- Issue date May 16, 2023
- Kioxia Corporation
- Chihiro Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,388,544
- Issue date Aug 20, 2019
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,381,198
- Issue date Aug 13, 2019
- TOSHIBA MEMORY CORPORATION
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method and method for manufacturing semiconductor device
- Patent number 10,332,906
- Issue date Jun 25, 2019
- TOSHIBA MEMORY CORPORATION
- Kaori Narumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,583,360
- Issue date Feb 28, 2017
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation method
- Patent number 9,111,875
- Issue date Aug 18, 2015
- Kabushiki Kaisha Toshiba
- Hiroshi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching unit
- Patent number 8,840,753
- Issue date Sep 23, 2014
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate plasma processing apparatus and plasma processing method
- Patent number 8,821,684
- Issue date Sep 2, 2014
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,821,744
- Issue date Sep 2, 2014
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,545,670
- Issue date Oct 1, 2013
- Kabushiki Kaisha Toshiba
- Akihiro Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 8,536,061
- Issue date Sep 17, 2013
- Kabushiki Kaisha Toshiba
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 8,524,609
- Issue date Sep 3, 2013
- Kabushiki Kaisha Toshiba
- Satoshi Inada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Plasma processing apparatus of substrate and plasma processing meth...
- Patent number 8,252,193
- Issue date Aug 28, 2012
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,084,360
- Issue date Dec 27, 2011
- Kabushiki Kaisha Toshiba
- Yusuke Kasahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 7,749,914
- Issue date Jul 6, 2010
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device and semiconductor stor...
- Patent number 7,727,899
- Issue date Jun 1, 2010
- Kabushiki Kaisha Toshiba
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing organic film using plasma etching and method o...
- Patent number 7,658,859
- Issue date Feb 9, 2010
- Kabushiki Kaisha Toshiba
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching unit
- Patent number 7,625,494
- Issue date Dec 1, 2009
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for plasma-etching organic material film
- Patent number 7,419,613
- Issue date Sep 2, 2008
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 7,285,498
- Issue date Oct 23, 2007
- Tokyo Electron Limited
- Kazuto Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabricating a metal wiring and metal contact in a semic...
- Patent number 6,794,286
- Issue date Sep 21, 2004
- Kabushiki Kaisha Toshiba
- Hisako Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus with reduced parasitic capacity and los...
- Patent number 6,780,278
- Issue date Aug 24, 2004
- Kabushiki Kaisha Toshiba
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device using mask pattern hav...
- Patent number 6,576,562
- Issue date Jun 10, 2003
- Kabushiki Kaisha Toshiba
- Junko Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a pattern
- Patent number 6,420,271
- Issue date Jul 16, 2002
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 6,274,512
- Issue date Aug 14, 2001
- Kabushiki Kaisha Toshiba
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a semiconductor device
- Patent number 6,090,699
- Issue date Jul 18, 2000
- Kabushiki Kaisha Toshiba
- Hisako Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 5,595,627
- Issue date Jan 21, 1997
- Tokyo Electron Limited
- Koichiro Inazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a wiring layer with a barrier layer
- Patent number 5,592,024
- Issue date Jan 7, 1997
- Kabushiki Kaisha Toshiba
- Hisako Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method and surface treatment apparatus
- Patent number 5,503,901
- Issue date Apr 2, 1996
- Kabushiki Kaisha Toshiba
- Takayuki Sakai
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 5,445,710
- Issue date Aug 29, 1995
- Kabushiki Kaisha Toshiba
- Masaru Hori
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD O...
- Publication number 20230114349
- Publication date Apr 13, 2023
- KIOXIA Corporation
- Chihiro ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210319986
- Publication date Oct 14, 2021
- Toshiba Memory Corporation
- Yosuke SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD O...
- Publication number 20210020450
- Publication date Jan 21, 2021
- Kioxia Corporation
- Chihiro ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20180145086
- Publication date May 24, 2018
- Toshiba Memory Corporation
- Kaori NARUMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO
- Publication number 20170186589
- Publication date Jun 29, 2017
- Kabushiki Kaisha Toshiba
- Yosuke SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO
- Publication number 20170169996
- Publication date Jun 15, 2017
- Kabushiki Kaisha Toshiba
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160027619
- Publication date Jan 28, 2016
- Kabushiki Kaisha Toshiba
- Yosuke SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20150162223
- Publication date Jun 11, 2015
- Kabushiki Kaisha Toshiba
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION METHOD
- Publication number 20150011089
- Publication date Jan 8, 2015
- KABUSHIKI KAISHA TOSHIBA
- Hiroshi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140083977
- Publication date Mar 27, 2014
- Kabushiki Kaisha Toshiba
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION METHOD
- Publication number 20130344698
- Publication date Dec 26, 2013
- Kabushiki Kaisha Toshiba
- Shunsuke OCHIAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20120228263
- Publication date Sep 13, 2012
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20120214308
- Publication date Aug 23, 2012
- Satoshi INADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20120080408
- Publication date Apr 5, 2012
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20120034785
- Publication date Feb 9, 2012
- Hisataka HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110269290
- Publication date Nov 3, 2011
- Yusuke KASAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MAN...
- Publication number 20110223750
- Publication date Sep 15, 2011
- Hisataka HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20100072172
- Publication date Mar 25, 2010
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING UNIT
- Publication number 20100024983
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20090194508
- Publication date Aug 6, 2009
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20090078678
- Publication date Mar 26, 2009
- Akihiro Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS OF SUBSTRATE AND PLASMA PROCESSING METH...
- Publication number 20080237185
- Publication date Oct 2, 2008
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device and semiconductor stor...
- Publication number 20070254472
- Publication date Nov 1, 2007
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and device for plasma-etching organic material film
- Publication number 20060213865
- Publication date Sep 28, 2006
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing organic film and method of manufacturing semic...
- Publication number 20060191867
- Publication date Aug 31, 2006
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and plasma etching apparatus
- Publication number 20050103441
- Publication date May 19, 2005
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method
- Publication number 20050085077
- Publication date Apr 21, 2005
- Kazuto Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20050082256
- Publication date Apr 21, 2005
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method and plasma etching unit
- Publication number 20050039854
- Publication date Feb 24, 2005
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device and method of cleaning...
- Publication number 20050009356
- Publication date Jan 13, 2005
- Akihiro Kojima
- H01 - BASIC ELECTRIC ELEMENTS

Hisataka HAYASHI

Person

Patents Grantslast 30 patents

Etching method, semiconductor manufacturing apparatus, and method o...

Substrate processing apparatus and substrate processing method

Plasma processing apparatus and plasma processing method

Dry etching method and method for manufacturing semiconductor device

Substrate processing apparatus and substrate processing method

Pattern formation method

Plasma etching unit

Substrate plasma processing apparatus and plasma processing method

Substrate processing method and substrate processing apparatus

Plasma processing apparatus and plasma processing method

Semiconductor device manufacturing method

Method of fabricating semiconductor device

Plasma processing apparatus of substrate and plasma processing meth...

Method of manufacturing semiconductor device

Plasma etching method

Manufacturing method of semiconductor device and semiconductor stor...

Method of processing organic film using plasma etching and method o...

Plasma etching method and plasma etching unit

Method and device for plasma-etching organic material film

Etching method

Process for fabricating a metal wiring and metal contact in a semic...

Plasma processing apparatus with reduced parasitic capacity and los...

Manufacturing method of semiconductor device using mask pattern hav...

Method of forming a pattern

Method for manufacturing a semiconductor device

Method of making a semiconductor device

Plasma etching method

Semiconductor device having a wiring layer with a barrier layer

Surface treatment method and surface treatment apparatus

Method of manufacturing semiconductor device

Patents Applicationslast 30 patents

ETCHING METHOD, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD O...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ETCHING METHOD, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD O...

DRY ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PATTERN FORMATION METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PATTERN FORMATION METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MAN...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA ETCHING UNIT

SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS OF SUBSTRATE AND PLASMA PROCESSING METH...

Manufacturing method of semiconductor device and semiconductor stor...

Method and device for plasma-etching organic material film

Method of processing organic film and method of manufacturing semic...

Etching method and plasma etching apparatus

Etching method

Plasma etching method

Plasma etching method and plasma etching unit

Method of manufacturing semiconductor device and method of cleaning...