Hisataka Kanada

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a semiconductor device have fin-shaped semicon...
- Patent number 8,536,000
- Issue date Sep 17, 2013
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for producing the same
- Patent number 8,063,437
- Issue date Nov 22, 2011
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for producing the same
- Patent number 8,004,045
- Issue date Aug 23, 2011
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam current sensor
- Patent number 7,888,937
- Issue date Feb 15, 2011
- Riken
- Tamaki Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus of fabricating semiconductor device
- Patent number 7,858,479
- Issue date Dec 28, 2010
- Panasonic Corporation
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam measuring equipment and beam measuring method using the same
- Patent number 7,535,220
- Issue date May 19, 2009
- Panasonic Corporation
- Yuichiro Sasaki
- G01 - MEASURING TESTING
Information Patent Grant
Liquid phase etching method and liquid phase etching apparatus
- Patent number 7,378,031
- Issue date May 27, 2008
- Matsushita Electric Industrial Co., Ltd.
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma doping
- Patent number 7,192,854
- Issue date Mar 20, 2007
- Matsushita Electric Industrial Co., Ltd.
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
- Publication number 20120015504
- Publication date Jan 19, 2012
- PANASONIC CORPORATION
- Yuichiro SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE HAVE FIN-SHAPED SEMICON...
- Publication number 20110275201
- Publication date Nov 10, 2011
- PANASONIC CORPORATION
- Yuichiro SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
- Publication number 20090289300
- Publication date Nov 26, 2009
- Yuichiro SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME
- Publication number 20090026540
- Publication date Jan 29, 2009
- Matsushita Electric Industrial, Ltd.
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PHASE ETCHING METHOD AND LIQUID PHASE ETCHING APPARATUS
- Publication number 20080196834
- Publication date Aug 21, 2008
- Matsushita Electric Industrial Co., Ltd.
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Beam Measuring Equipment and Beam Measuring Method Using the Same
- Publication number 20080024126
- Publication date Jan 31, 2008
- Matsushita Electric Industrial Co., Ltd.
- Yuichiro Sasaki
- G01 - MEASURING TESTING
Information Patent Application
Beam Current Sensor
- Publication number 20070229057
- Publication date Oct 4, 2007
- Tamaki Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Method And Apparatus Of Fabricating Semiconductor Device
- Publication number 20070212837
- Publication date Sep 13, 2007
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for liquid etching
- Publication number 20060049140
- Publication date Mar 9, 2006
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma doping
- Publication number 20050287776
- Publication date Dec 29, 2005
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Hisataka Kanada

Person

Patents Grantslast 30 patents

Method for producing a semiconductor device have fin-shaped semicon...

Semiconductor device and method for producing the same

Semiconductor device and method for producing the same

Beam current sensor

Method and apparatus of fabricating semiconductor device

Beam measuring equipment and beam measuring method using the same

Liquid phase etching method and liquid phase etching apparatus

Method of plasma doping

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME

METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE HAVE FIN-SHAPED SEMICON...

SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME

LIQUID PHASE ETCHING METHOD AND LIQUID PHASE ETCHING APPARATUS

Beam Measuring Equipment and Beam Measuring Method Using the Same

Beam Current Sensor

Method And Apparatus Of Fabricating Semiconductor Device

Method and apparatus for liquid etching

Method of plasma doping