Hitoshi Kato

Person

Iwate, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition method and deposition apparatus
- Patent number 12,368,030
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing film and film deposition system
- Patent number 12,205,817
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,051,566
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method
- Patent number 11,952,661
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus and film deposition method
- Patent number 11,905,595
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generation apparatus, deposition apparatus using the same, a...
- Patent number 11,823,865
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 11,710,633
- Issue date Jul 25, 2023
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 11,674,225
- Issue date Jun 13, 2023
- Tokyo Electron Limted
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding mechanism and substrate processing apparatus
- Patent number 11,664,201
- Issue date May 30, 2023
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus and film deposition method
- Patent number 11,655,539
- Issue date May 23, 2023
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotation detection jig, substrate processing apparatus and method o...
- Patent number 11,572,625
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a silicon nitride film and film deposition ap...
- Patent number 11,519,067
- Issue date Dec 6, 2022
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,417,521
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and film deposition method
- Patent number 11,359,279
- Issue date Jun 14, 2022
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 11,264,266
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,248,294
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 11,155,918
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus
- Patent number 11,136,669
- Issue date Oct 5, 2021
- TOKYO ELECTRON LIMIIED
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 11,118,267
- Issue date Sep 14, 2021
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition method and computer program storage medium
- Patent number 11,118,265
- Issue date Sep 14, 2021
- Tokyo Electron Limited
- Shigenori Ozaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and recording medium
- Patent number 11,085,113
- Issue date Aug 10, 2021
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a silicon nitride film and film deposition ap...
- Patent number 11,075,074
- Issue date Jul 27, 2021
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,920,316
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition method and film deposition apparatus
- Patent number 10,844,487
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Yutaka Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding mechanism and substrate processing apparatus usin...
- Patent number 10,790,182
- Issue date Sep 29, 2020
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation time setting method
- Patent number 10,787,740
- Issue date Sep 29, 2020
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing a silicon nitride film and film deposition ap...
- Patent number 10,748,758
- Issue date Aug 18, 2020
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 10,683,573
- Issue date Jun 16, 2020
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a silicon nitride film and film deposition ap...
- Patent number 10,643,837
- Issue date May 5, 2020
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition method of depositing film and film deposition appar...
- Patent number 10,636,648
- Issue date Apr 28, 2020
- Tokyo Electron Limited
- Kazumi Kubo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250129472
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING SYSTEM
- Publication number 20250129479
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250129482
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250128298
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- B08 - CLEANING
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS
- Publication number 20240404795
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS
- Publication number 20240401198
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240401199
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS
- Publication number 20240347351
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20240304416
- Publication date Sep 12, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240076777
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
- Publication number 20230245858
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20230230817
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATION APPARATUS, DEPOSITION APPARATUS USING THE SAME, A...
- Publication number 20220336190
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220230852
- Publication date Jul 21, 2022
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20220223375
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS AND DEPOSITION METHOD
- Publication number 20220223463
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING FILM AND FILM DEPOSITION SYSTEM
- Publication number 20220223408
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20210249264
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20210249265
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING MECHANISM AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210249235
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
- Publication number 20210246550
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS AND DEPOSITION METHOD
- Publication number 20210087684
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Yu SASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20200234997
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING PROCESSING APPARATUS, FILM-FORMING METHOD, AND STORAGE...
- Publication number 20200157683
- Publication date May 21, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND FILM DEPOSITION METHOD
- Publication number 20200141001
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
- Publication number 20200040456
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING A SILICON NITRIDE FILM AND FILM DEPOSITION AP...
- Publication number 20200032390
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD
- Publication number 20200017968
- Publication date Jan 16, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20190382894
- Publication date Dec 19, 2019
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190360093
- Publication date Nov 28, 2019
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hitoshi Kato

Person

Patents Grantslast 30 patents

Deposition method and deposition apparatus

Method for depositing film and film deposition system

Plasma processing apparatus

Deposition method

Film deposition apparatus and film deposition method

Plasma generation apparatus, deposition apparatus using the same, a...

Deposition method and deposition apparatus

Substrate processing apparatus

Substrate holding mechanism and substrate processing apparatus

Film deposition apparatus and film deposition method

Rotation detection jig, substrate processing apparatus and method o...

Method for depositing a silicon nitride film and film deposition ap...

Film forming method and film forming apparatus

Cleaning method and film deposition method

Substrate processing method

Substrate processing apparatus

Film forming apparatus

Film formation apparatus

Substrate processing method

Film deposition method and computer program storage medium

Film forming method and recording medium

Method for depositing a silicon nitride film and film deposition ap...

Substrate processing apparatus

Film deposition method and film deposition apparatus

Substrate holding mechanism and substrate processing apparatus usin...

Film formation time setting method

Method for depositing a silicon nitride film and film deposition ap...

Film forming apparatus

Method for depositing a silicon nitride film and film deposition ap...

Film deposition method of depositing film and film deposition appar...

Patents Applicationslast 30 patents

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

FILM-FORMING METHOD AND FILM-FORMING SYSTEM

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

CLEANING METHOD AND FILM-FORMING APPARATUS

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS

ANTENNA AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

DEPOSITION METHOD AND DEPOSITION APPARATUS

PLASMA GENERATION APPARATUS, DEPOSITION APPARATUS USING THE SAME, A...

PLASMA PROCESSING APPARATUS

ANTENNA AND PLASMA PROCESSING APPARATUS

DEPOSITION APPARATUS AND DEPOSITION METHOD

METHOD FOR DEPOSITING FILM AND FILM DEPOSITION SYSTEM

FILM FORMING METHOD AND FILM FORMING APPARATUS

DEPOSITION METHOD AND DEPOSITION APPARATUS

SUBSTRATE HOLDING MECHANISM AND SUBSTRATE PROCESSING APPARATUS

FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

DEPOSITION APPARATUS AND DEPOSITION METHOD

SUBSTRATE PROCESSING METHOD

FILM-FORMING PROCESSING APPARATUS, FILM-FORMING METHOD, AND STORAGE...

CLEANING METHOD AND FILM DEPOSITION METHOD

FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

METHOD FOR DEPOSITING A SILICON NITRIDE FILM AND FILM DEPOSITION AP...

DEPOSITION METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS