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Plasma processing method
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Hitachi High-Technologies Corporation
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Dry etching method
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Patent number 8,207,066
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Hitachi High-Technologies Corporation
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Yoshiharu Inoue
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma etching method
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Patent number 6,620,737
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Issue date Sep 16, 2003
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Hitachi, Ltd.
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H01 - BASIC ELECTRIC ELEMENTS