Hitoshi Kobayashi

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Fujisawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 8,486,291
- Issue date Jul 16, 2013
- Hitachi High-Technologies Corporation
- Takeshi Ohmori
- B08 - CLEANING
Information Patent Grant
Dry etching method
- Patent number 8,207,066
- Issue date Jun 26, 2012
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 6,620,737
- Issue date Sep 16, 2003
- Hitachi, Ltd.
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20120125890
- Publication date May 24, 2012
- Hitachi High-Technologies Corporation
- Takeshi OHMORI
- B08 - CLEANING
Information Patent Application
DRY ETCHING METHOD
- Publication number 20100255612
- Publication date Oct 7, 2010
- Hitachi High-Technologies Corporation
- Yoshiharu INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD FOR ETCHING SAMPLE
- Publication number 20090081872
- Publication date Mar 26, 2009
- Hitoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mail transmitting/receiving device and method
- Publication number 20030055905
- Publication date Mar 20, 2003
- Hitachi, Ltd
- Mika Nishiyama
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Plasma etching method
- Publication number 20030022512
- Publication date Jan 30, 2003
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS