Hitoshi Kosugi

Person

Koshi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
System and methods for wafer drying
- Patent number 12,002,687
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Trace Hurd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and ch...
- Patent number 11,545,367
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Tetsuya Sakazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for wafer drying
- Patent number 11,515,178
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Trace Hurd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid treatment apparatus
- Patent number 11,309,194
- Issue date Apr 19, 2022
- Tokyo Electron Limited
- Koji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,217,451
- Issue date Jan 4, 2022
- Tokyo Electron Limited
- Hitoshi Kosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method, film forming apparatus and pattern forming method
- Patent number 8,889,337
- Issue date Nov 18, 2014
- Tokyo Electron Limited
- Hitoshi Kosugi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, computer-readable storage medium and s...
- Patent number 8,420,303
- Issue date Apr 16, 2013
- Tokyo Electron Limited
- Yoshiaki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist coating and developing apparatus, substrate transfer me...
- Patent number 8,376,637
- Issue date Feb 19, 2013
- Tokyo Electron Limited
- Yoshiaki Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and apparatus
- Patent number 8,133,663
- Issue date Mar 13, 2012
- Tokyo Electron Limited
- Taro Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating/developing apparatus and pattern forming method
- Patent number 7,924,396
- Issue date Apr 12, 2011
- Tokyo Electron Limited
- Hisashi Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Circulation system for high refractive index liquid in pattern form...
- Patent number 7,826,032
- Issue date Nov 2, 2010
- Tokyo Electron Limited
- Taro Yamamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and system for determining condition of process performed fo...
- Patent number 7,733,472
- Issue date Jun 8, 2010
- Tokyo Electron Limited
- Taro Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge exposure apparatus, coating and developing apparatus, edge exp...
- Patent number 7,651,285
- Issue date Jan 26, 2010
- Tokyo Electron Limited
- Hitoshi Kosugi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing method and developing apparatus
- Patent number 6,496,245
- Issue date Dec 17, 2002
- Tokyo Electron Limited
- Hitoshi Kosugi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Developing apparatus and developing nozzle
- Patent number 6,267,516
- Issue date Jul 31, 2001
- Tokyo Electron Limited
- Shuichi Nagamine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
System and Methods for Wafer Drying
- Publication number 20230092779
- Publication date Mar 23, 2023
- TOKYO ELECTRON LIMITED
- Trace Hurd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND CH...
- Publication number 20230041889
- Publication date Feb 9, 2023
- TOKYO ELECTRON LIMITED
- Tetsuya SAKAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220059357
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Hitoshi KOSUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Methods for Wafer Drying
- Publication number 20210287919
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Trace Hurd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND CH...
- Publication number 20210233780
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Tetsuya SAKAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200234998
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KOSUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200126817
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Hitoshi KOSUGI
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID TREATMENT APPARATUS
- Publication number 20180218924
- Publication date Aug 2, 2018
- TOKYO ELECTRON LIMITED
- Koji TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND S...
- Publication number 20110143289
- Publication date Jun 16, 2011
- TOKYO ELECTRON LIMITED
- Yoshiaki YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM
- Publication number 20110143290
- Publication date Jun 16, 2011
- TOKYO ELECTRON LIMITED
- Keiichi TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COATING AND DEVELOPING APPARATUS, SUBSTRATE TRANSFER ME...
- Publication number 20110117492
- Publication date May 19, 2011
- TOKYO ELECTRON LIMITED
- Yoshiaki Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING/DEVELOPING APPARATUS AND PATTERN FORMING METHOD
- Publication number 20080204675
- Publication date Aug 28, 2008
- TOKYO ELECTRON LIMITED
- Hisashi Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING METHOD, FILM FORMING APPARATUS AND PATTERN FORMING METHOD
- Publication number 20080118861
- Publication date May 22, 2008
- TOKYO ELECTRON LIMITED
- Hitoshi Kosugi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Edge exposure apparatus, coating and developing apparatus, edge exp...
- Publication number 20080088809
- Publication date Apr 17, 2008
- TOKYO ELECTRON LIMITED
- Hitoshi Kosugi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING CONDITION OF PROCESS PERFORMED FO...
- Publication number 20080037013
- Publication date Feb 14, 2008
- TOKYO ELECTRON LIMITED
- Taro Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND APPARATUS
- Publication number 20080038671
- Publication date Feb 14, 2008
- TOKYO ELECTRON LIMITED
- Taro YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CIRCULATION SYSTEM FOR HIGH REFRACTIVE INDEX LIQUID IN PATTERN FORM...
- Publication number 20080018868
- Publication date Jan 24, 2008
- TOKYO ELECTRON LIMITED
- Taro YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Developing method and developing apparatus
- Publication number 20020008857
- Publication date Jan 24, 2002
- TOKYO ELECTRON LIMITED
- Hitoshi Kosugi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Hitoshi Kosugi

Person

Patents Grantslast 30 patents

System and methods for wafer drying

Substrate processing apparatus, substrate processing method, and ch...

System and methods for wafer drying

Substrate liquid treatment apparatus

Substrate processing method and substrate processing apparatus

Film forming method, film forming apparatus and pattern forming method

Substrate processing method, computer-readable storage medium and s...

Photoresist coating and developing apparatus, substrate transfer me...

Pattern forming method and apparatus

Coating/developing apparatus and pattern forming method

Circulation system for high refractive index liquid in pattern form...

Method and system for determining condition of process performed fo...

Edge exposure apparatus, coating and developing apparatus, edge exp...

Developing method and developing apparatus

Developing apparatus and developing nozzle

Patents Applicationslast 30 patents

System and Methods for Wafer Drying

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND CH...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

System and Methods for Wafer Drying

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND CH...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE LIQUID TREATMENT APPARATUS

SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND S...

DEVELOPING TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM

PHOTORESIST COATING AND DEVELOPING APPARATUS, SUBSTRATE TRANSFER ME...

COATING/DEVELOPING APPARATUS AND PATTERN FORMING METHOD

FILM FORMING METHOD, FILM FORMING APPARATUS AND PATTERN FORMING METHOD

Edge exposure apparatus, coating and developing apparatus, edge exp...

METHOD AND SYSTEM FOR DETERMINING CONDITION OF PROCESS PERFORMED FO...

PATTERN FORMING METHOD AND APPARATUS

CIRCULATION SYSTEM FOR HIGH REFRACTIVE INDEX LIQUID IN PATTERN FORM...

Developing method and developing apparatus