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Hitoshi MARUYAMA
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Annaka, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Photosensitive resin composition, pattern forming process, and fabr...
Patent number
11,693,317
Issue date
Jul 4, 2023
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive resin composition, photosensitive resin coating, pho...
Patent number
11,693,318
Issue date
Jul 4, 2023
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Siloxane polymer containing isocyanuric acid and polyether skeleton...
Patent number
11,548,985
Issue date
Jan 10, 2023
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition, photosensitive resin coating, pho...
Patent number
11,526,078
Issue date
Dec 13, 2022
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Silicone structure-containing polymer, photosensitive resin composi...
Patent number
11,402,756
Issue date
Aug 2, 2022
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photosensitive resin composition and pattern forming process
Patent number
11,294,284
Issue date
Apr 5, 2022
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Epoxy-containing, isocyanurate-modified silicone resin, photosensit...
Patent number
11,294,282
Issue date
Apr 5, 2022
Shin-Etsu Chemical Co., Ltd.
Kumiko Hayashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photosensitive resin composition, photosensitive dry film, and patt...
Patent number
11,262,655
Issue date
Mar 1, 2022
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photosensitive resin composition, photosensitive dry film, and patt...
Patent number
11,187,982
Issue date
Nov 30, 2021
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive resin composition, pattern forming process, and fabr...
Patent number
11,156,919
Issue date
Oct 26, 2021
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Polysiloxane skeleton polymer, photosensitive resin composition, pa...
Patent number
11,119,409
Issue date
Sep 14, 2021
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Polymer containing silphenylene and polyether structures
Patent number
10,982,053
Issue date
Apr 20, 2021
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Silicone-modified polybenzoxazole resin and making method
Patent number
10,538,630
Issue date
Jan 21, 2020
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition, photosensitive dry film, photosen...
Patent number
10,503,067
Issue date
Dec 10, 2019
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Silicone skeleton-containing polymer, photo-curable resin compositi...
Patent number
10,451,970
Issue date
Oct 22, 2019
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
Publication number
20240210831
Publication date
Jun 27, 2024
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR PATTERNING
Publication number
20240184206
Publication date
Jun 6, 2024
Shin-Etsu Chemical Co., Ltd.
Kumiko HAYASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
Publication number
20240160105
Publication date
May 16, 2024
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING, PHO...
Publication number
20230076103
Publication date
Mar 9, 2023
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
Publication number
20230030194
Publication date
Feb 2, 2023
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYSILOXANE SKELETON POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PA...
Publication number
20200165456
Publication date
May 28, 2020
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
SILOXANE POLYMER CONTAINING ISOCYANURIC ACID AND POLYETHER SKELETON...
Publication number
20200165394
Publication date
May 28, 2020
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING PROCESS, AND ANTI...
Publication number
20200157348
Publication date
May 21, 2020
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G02 - OPTICS
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATT...
Publication number
20200117089
Publication date
Apr 16, 2020
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20200026189
Publication date
Jan 23, 2020
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING, PHO...
Publication number
20200026190
Publication date
Jan 23, 2020
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYMER CONTAINING SILPHENYLENE AND POLYETHER STRUCTURES
Publication number
20190352465
Publication date
Nov 21, 2019
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATT...
Publication number
20190354014
Publication date
Nov 21, 2019
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING PROCESS, AND FABR...
Publication number
20190354013
Publication date
Nov 21, 2019
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING PROCESS, AND FABR...
Publication number
20190196331
Publication date
Jun 27, 2019
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
EPOXY-CONTAINING, ISOCYANURATE-MODIFIED SILICONE RESIN, PHOTOSENSIT...
Publication number
20190064666
Publication date
Feb 28, 2019
Shin-Etsu Chemical Co., Ltd.
Kumiko Hayashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SILICONE STRUCTURE-CONTAINING POLYMER, PHOTOSENSITIVE RESIN COMPOSI...
Publication number
20190049844
Publication date
Feb 14, 2019
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING, PHO...
Publication number
20190049843
Publication date
Feb 14, 2019
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PHOTOSEN...
Publication number
20180224743
Publication date
Aug 9, 2018
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
SILICONE-MODIFIED POLYBENZOXAZOLE RESIN AND MAKING METHOD
Publication number
20180223049
Publication date
Aug 9, 2018
Shin-Etsu Chemical Co., Ltd.
Hitoshi Maruyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
SILICONE SKELETON-CONTAINING POLYMER, PHOTO-CURABLE RESIN COMPOSITI...
Publication number
20180004088
Publication date
Jan 4, 2018
Shin-Etsu Chemical Co., Ltd.
Hitoshi MARUYAMA
B32 - LAYERED PRODUCTS