Hitoshi Nakano

Person

Utsunomiya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Lithography apparatus, lithography method, program, lithography sys...
- Patent number 9,927,725
- Issue date Mar 27, 2018
- Canon Kabushiki Kaisha
- Yoshikazu Miyajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus and article manufacturing method
- Patent number 9,915,881
- Issue date Mar 13, 2018
- Canon Kabushiki Kaisha
- Yoshikazu Miyajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus, imprint method, and method of manufacturing article
- Patent number 9,835,941
- Issue date Dec 5, 2017
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method for determining pattern of mold for imprint, imprint method,...
- Patent number 9,829,789
- Issue date Nov 28, 2017
- Canon Kabushiki Kaisha
- Masayuki Tanabe
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Exposure apparatus and device fabrication method
- Patent number 9,454,087
- Issue date Sep 27, 2016
- Canon Kabushiki Kaisha
- Kenichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure technique
- Patent number 7,679,718
- Issue date Mar 16, 2010
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure technique
- Patent number 7,619,714
- Issue date Nov 17, 2009
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure technique
- Patent number 7,561,248
- Issue date Jul 14, 2009
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure technique
- Patent number 7,466,393
- Issue date Dec 16, 2008
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure technique
- Patent number 7,450,216
- Issue date Nov 11, 2008
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure technique
- Patent number 7,420,651
- Issue date Sep 2, 2008
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure technique
- Patent number 7,372,542
- Issue date May 13, 2008
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure technique
- Patent number 7,349,064
- Issue date Mar 25, 2008
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical filter arrangement for a semiconductor manufacturing appar...
- Patent number 7,186,285
- Issue date Mar 6, 2007
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Exposure technique
- Patent number 7,145,629
- Issue date Dec 5, 2006
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical filter arrangement for a semiconductor manufacturing appar...
- Patent number 6,924,877
- Issue date Aug 2, 2005
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Exposure apparatus, device manufacturing method, gas substituting a...
- Patent number 6,788,392
- Issue date Sep 7, 2004
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Load-lock chamber and exposure apparatus using the same
- Patent number 6,734,950
- Issue date May 11, 2004
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 6,665,046
- Issue date Dec 16, 2003
- Canon Kabushiki Kaisha
- Hideki Nogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and apparatus
- Patent number 5,121,160
- Issue date Jun 9, 1992
- Canon Kabushiki Kaisha
- Naoto Sano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method and a projection exposure apparatus using the same
- Patent number 4,952,060
- Issue date Aug 28, 1990
- Canon Kabushiki Kaisha
- Hideki Ina
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, PROGRAM, LITHOGRAPHY SYS...
- Publication number 20160238946
- Publication date Aug 18, 2016
- Canon Kabushiki Kaisha
- Yoshikazu Miyajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20150355558
- Publication date Dec 10, 2015
- Canon Kabushiki Kaisha
- Yoshikazu Miyajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20150123312
- Publication date May 7, 2015
- Canon Kabushiki Kaisha
- Hitoshi NAKANO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR DETERMINING PATTERN OF MOLD FOR IMPRINT, IMPRINT METHOD,...
- Publication number 20150123300
- Publication date May 7, 2015
- Canon Kabushiki Kaisha
- Masayuki Tanabe
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
STAGE APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING...
- Publication number 20150070680
- Publication date Mar 12, 2015
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD
- Publication number 20130293854
- Publication date Nov 7, 2013
- Canon Kabushiki Kaisha
- Kenichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20090268175
- Publication date Oct 29, 2009
- Canon Kabushiki Kaisha
- Takahito Chibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20090073399
- Publication date Mar 19, 2009
- Canon Kabushiki Kaisha
- Takahito Chibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION EXPOSURE TECHNIQUE
- Publication number 20080291409
- Publication date Nov 27, 2008
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION EXPOSURE TECHNIQUE
- Publication number 20080252864
- Publication date Oct 16, 2008
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
- Publication number 20080198345
- Publication date Aug 21, 2008
- Canon Kabushiki Kaisha
- Youji Kawasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
- Publication number 20080198347
- Publication date Aug 21, 2008
- Canon Kabushiki Kaisha
- Youji Kawasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION EXPOSURE TECHNIQUE
- Publication number 20080170211
- Publication date Jul 17, 2008
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION EXPOSURE TECHNIQUE
- Publication number 20080018871
- Publication date Jan 24, 2008
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION EXPOSURE TECHNIQUE
- Publication number 20070229783
- Publication date Oct 4, 2007
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION EXPOSURE TECHNIQUE
- Publication number 20070229784
- Publication date Oct 4, 2007
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL FILTER ARRANGEMENT FOR ASEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20070119131
- Publication date May 31, 2007
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Immersion exposure technique
- Publication number 20060209286
- Publication date Sep 21, 2006
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure technique
- Publication number 20060033893
- Publication date Feb 16, 2006
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical filter arrangement for a semiconductor manufacturing appar...
- Publication number 20050268581
- Publication date Dec 8, 2005
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Immersion exposure technique
- Publication number 20040263809
- Publication date Dec 30, 2004
- Canon Kabushiki Kaisha
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor manufacturing apparatus
- Publication number 20030095242
- Publication date May 22, 2003
- Hitoshi Nakano
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Exposure apparatus, device manufacturing method, gas substituting a...
- Publication number 20020057425
- Publication date May 16, 2002
- Hitoshi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Load-lock chamber and exposure apparatus using the same
- Publication number 20020024645
- Publication date Feb 28, 2002
- Hitoshi Nakano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Exposure apparatus and device manufacturing method
- Publication number 20020018190
- Publication date Feb 14, 2002
- Hideki Nogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hitoshi Nakano

Person

Patents Grantslast 30 patents

Lithography apparatus, lithography method, program, lithography sys...

Lithography apparatus and article manufacturing method

Imprint apparatus, imprint method, and method of manufacturing article

Method for determining pattern of mold for imprint, imprint method,...

Exposure apparatus and device fabrication method

Immersion exposure technique

Immersion exposure technique

Immersion exposure technique

Immersion exposure technique

Immersion exposure technique

Immersion exposure technique

Immersion exposure technique

Immersion exposure technique

Chemical filter arrangement for a semiconductor manufacturing appar...

Exposure technique

Chemical filter arrangement for a semiconductor manufacturing appar...

Exposure apparatus, device manufacturing method, gas substituting a...

Load-lock chamber and exposure apparatus using the same

Exposure apparatus and device manufacturing method

Exposure method and apparatus

Alignment method and a projection exposure apparatus using the same

Patents Applicationslast 30 patents

LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, PROGRAM, LITHOGRAPHY SYS...

LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTURING METHOD

IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

METHOD FOR DETERMINING PATTERN OF MOLD FOR IMPRINT, IMPRINT METHOD,...

STAGE APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING...

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS

IMMERSION EXPOSURE TECHNIQUE

IMMERSION EXPOSURE TECHNIQUE

EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE

IMMERSION EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE

IMMERSION EXPOSURE TECHNIQUE

IMMERSION EXPOSURE TECHNIQUE

IMMERSION EXPOSURE TECHNIQUE

IMMERSION EXPOSURE TECHNIQUE

CHEMICAL FILTER ARRANGEMENT FOR ASEMICONDUCTOR MANUFACTURING APPARATUS

Immersion exposure technique

Exposure technique

Chemical filter arrangement for a semiconductor manufacturing appar...

Immersion exposure technique

Semiconductor manufacturing apparatus

Exposure apparatus, device manufacturing method, gas substituting a...

Load-lock chamber and exposure apparatus using the same

Exposure apparatus and device manufacturing method