Hitoshi Osaki

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 11,705,331
- Issue date Jul 18, 2023
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Modification method of substrate surface, and composition and polymer
- Patent number 11,525,067
- Issue date Dec 13, 2022
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for film formation, film-forming method and directed se...
- Patent number 11,460,767
- Issue date Oct 4, 2022
- JSR Corporation
- Hiroyuki Komatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method and patterned substrate
- Patent number 11,462,405
- Issue date Oct 4, 2022
- JSR Corporation
- Hiroyuki Komatsu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Modification method of surface of base, composition, and polymer
- Patent number 11,426,761
- Issue date Aug 30, 2022
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 11,370,872
- Issue date Jun 28, 2022
- JSR Corporation
- Masafumi Hori
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 11,211,246
- Issue date Dec 28, 2021
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Pattern-forming method
- Patent number 11,195,714
- Issue date Dec 7, 2021
- JSR Corporation
- Hitoshi Osaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 10,950,438
- Issue date Mar 16, 2021
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective modification method of a base material surface
- Patent number 10,923,342
- Issue date Feb 16, 2021
- JSR Corporation
- Hitoshi Osaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-forming method and composition
- Patent number 10,691,019
- Issue date Jun 23, 2020
- JSR Corporation
- Hiroyuki Komatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method and composition
- Patent number 10,394,121
- Issue date Aug 27, 2019
- JSR Corporation
- Hitoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method and composition
- Patent number 10,175,575
- Issue date Jan 8, 2019
- JSR Corporation
- Hitoshi Osaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist pattern-forming method and photoresist composition
- Patent number 9,594,303
- Issue date Mar 14, 2017
- JSR Corporation
- Hitoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 9,040,221
- Issue date May 26, 2015
- JSR Corporation
- Hitoshi Osaki
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20210318614
- Publication date Oct 14, 2021
- JSR Corporation
- Hitoshi OSAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20210166935
- Publication date Jun 3, 2021
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20200402789
- Publication date Dec 24, 2020
- JSR Corporation
- Hitoshi OSAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFICATION METHOD OF SURFACE OF BASE, COMPOSITION, AND POLYMER
- Publication number 20200384499
- Publication date Dec 10, 2020
- JSR Corporation
- Hiroyuki KOMATSU
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20200379348
- Publication date Dec 3, 2020
- JSR Corporation
- Hitoshi OSAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING COVER FILM
- Publication number 20200148845
- Publication date May 14, 2020
- JSR Corporation
- Hitoshi OSAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN-FORMING METHOD AND PATTERNED SUBSTRATE
- Publication number 20200118819
- Publication date Apr 16, 2020
- JSR Corporation
- Hiroyuki KOMATSU
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
MODIFICATION METHOD OF SUBSTRATE SURFACE, AND COMPOSITION AND POLYMER
- Publication number 20200087530
- Publication date Mar 19, 2020
- JSR Corporation
- Hiroyuki KOMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELECTIVE MODIFICATION METHOD OF A BASE MATERIAL SURFACE
- Publication number 20200051813
- Publication date Feb 13, 2020
- JSR Corporation
- Hitoshi OSAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT SYSTEM AND DIRECTED...
- Publication number 20200013617
- Publication date Jan 9, 2020
- JSR Corporation
- Hiroyuki KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM-FORMING METHOD AND DIRECTED SE...
- Publication number 20190233561
- Publication date Aug 1, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION
- Publication number 20190235386
- Publication date Aug 1, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20190198316
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, MODIFICATION METHOD AND SELECTIVE MODIFICATION METHOD...
- Publication number 20190194365
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20190198317
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki Komatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20190135967
- Publication date May 9, 2019
- JSR Corporation
- Masafumi HORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION
- Publication number 20190107777
- Publication date Apr 11, 2019
- JSR Corporation
- Hitoshi OSAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FORMING METHOD OF CONTACT HOLE PATTERN
- Publication number 20180192524
- Publication date Jul 5, 2018
- JSR Corporation
- Hitoshi OSAKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION
- Publication number 20170351174
- Publication date Dec 7, 2017
- JSR Corporation
- Hitoshi OSAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170255096
- Publication date Sep 7, 2017
- JSR Corporation
- Hitoshi OSAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST-PATTERNING METHOD, AN...
- Publication number 20150093704
- Publication date Apr 2, 2015
- JSR Corporation
- Hitoshi OSAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION
- Publication number 20150010866
- Publication date Jan 8, 2015
- JSR Corporation
- Hitoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20130122426
- Publication date May 16, 2013
- JSR Corporation
- Hitoshi Osaki
- C07 - ORGANIC CHEMISTRY

Hitoshi Osaki

Person

Patents Grantslast 30 patents

Method and composition for selectively modifying base material surface

Modification method of substrate surface, and composition and polymer

Composition for film formation, film-forming method and directed se...

Pattern-forming method and patterned substrate

Modification method of surface of base, composition, and polymer

Composition for pattern formation, and pattern-forming method

Method and composition for selectively modifying base material surface

Pattern-forming method

Method and composition for selectively modifying base material surface

Selective modification method of a base material surface

Pattern-forming method and composition

Pattern-forming method and composition

Pattern-forming method and composition

Resist pattern-forming method and photoresist composition

Radiation-sensitive resin composition, method for forming resist pa...

Patents Applicationslast 30 patents

PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

PATTERN-FORMING METHOD

MODIFICATION METHOD OF SURFACE OF BASE, COMPOSITION, AND POLYMER

PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION

METHOD FOR FORMING COVER FILM

PATTERN-FORMING METHOD AND PATTERNED SUBSTRATE

MODIFICATION METHOD OF SUBSTRATE SURFACE, AND COMPOSITION AND POLYMER

SELECTIVE MODIFICATION METHOD OF A BASE MATERIAL SURFACE

SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT SYSTEM AND DIRECTED...

COMPOSITION FOR FILM FORMATION, FILM-FORMING METHOD AND DIRECTED SE...

PATTERN-FORMING METHOD AND COMPOSITION

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

COMPOSITION, MODIFICATION METHOD AND SELECTIVE MODIFICATION METHOD...

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

PATTERN-FORMING METHOD AND COMPOSITION

FORMING METHOD OF CONTACT HOLE PATTERN

PATTERN-FORMING METHOD AND COMPOSITION

PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST-PATTERNING METHOD, AN...

RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...