Hitoshi Shiraishi

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Stacked film including a semiconductor film having a taper angle, a...
- Patent number 7,781,837
- Issue date Aug 24, 2010
- NEC Corporation
- Nobuya Seko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming contact hole
- Patent number 7,618,898
- Issue date Nov 17, 2009
- NEC Corporation
- Hitoshi Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern of stacked film
- Patent number 7,317,227
- Issue date Jan 8, 2008
- NEC Corporation
- Hitoshi Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern of stacked film and thin film transistor
- Patent number 7,303,945
- Issue date Dec 4, 2007
- NEC Corporation
- Nobuya Seko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern of stacked film
- Patent number 6,933,241
- Issue date Aug 23, 2005
- NEC Corporation
- Hitoshi Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for forming contact hole
- Publication number 20100025685
- Publication date Feb 4, 2010
- NEC Corporation
- Hitoshi Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming pattern of stacked film and thin film transistor
- Publication number 20080048264
- Publication date Feb 28, 2008
- NEC Corporation
- Nobuya Seko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for forming contact hole
- Publication number 20050221614
- Publication date Oct 6, 2005
- NEC Corporation
- Hitoshi Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming pattern of stacked film and thin film transistor
- Publication number 20050156239
- Publication date Jul 21, 2005
- NEC Corporation
- Nobuya Seko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming pattern of stacked film
- Publication number 20040219721
- Publication date Nov 4, 2004
- NEC Corporation
- Hitoshi Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming pattern of stacked film
- Publication number 20030228760
- Publication date Dec 11, 2003
- NEC Corporation
- Hitoshi Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS