Ho Wei De

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Hsinchu City, TW

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Patents Grantslast 30 patents

Information Patent Grant
Cut-mask patterning process for fin-like field effect transistor (F...
- Patent number 9,236,267
- Issue date Jan 12, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ho Wei De
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning process for fin-like field effect transistor (finFET) de...
- Patent number 8,741,776
- Issue date Jun 3, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ho Wei De
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CUT-MASK PATTERNING PROCESS FOR FIN-LIKE FIELD EFFECT TRANSISTOR (F...
- Publication number 20130210232
- Publication date Aug 15, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ho Wei De
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING PROCESS FOR FIN-LIKE FIELD EFFECT TRANSISTOR (FINFET) DE...
- Publication number 20130203257
- Publication date Aug 8, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ho Wei De
- H01 - BASIC ELECTRIC ELEMENTS