Hoa D. Truong

Person

Los Altos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self-priming resist for generic inorganic hardmasks
- Patent number 11,226,561
- Issue date Jan 18, 2022
- International Business Machines Corporation
- Chi-Chun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nitrogen heterocycle-containing monolayers on metal oxides for bind...
- Patent number 10,915,023
- Issue date Feb 9, 2021
- International Business Machines Corporation
- Shu-Jen Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorinated sulfonate esters of aryl ketones for non-ionic photo-ac...
- Patent number 9,983,475
- Issue date May 29, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-ionic aryl ketone based polymeric photo-acid generators
- Patent number 9,951,164
- Issue date Apr 24, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-ionic low diffusing photo-acid generators
- Patent number 9,950,999
- Issue date Apr 24, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block copolymers for directed self-assembly applications
- Patent number 9,879,152
- Issue date Jan 30, 2018
- International Business Machines Corporation
- Noel Arellano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generating polymers containing a urethane linkage for lit...
- Patent number 9,851,639
- Issue date Dec 26, 2017
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wet strippable gap fill materials
- Patent number 9,671,694
- Issue date Jun 6, 2017
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist performance for the negative tone develop organic developmen...
- Patent number 9,389,516
- Issue date Jul 12, 2016
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-ionic photo-acid generating polymers for resist applications
- Patent number 9,244,345
- Issue date Jan 26, 2016
- International Business Machines Corporation
- Takehisa Ishimaru
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist performance for the negative tone develop organic developmen...
- Patent number 9,057,960
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified photoresist composition and process for its use
- Patent number 9,057,951
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-topcoating resist for photolithography
- Patent number 8,945,808
- Issue date Feb 3, 2015
- International Business Machines Corporation
- Robert Allen David
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive tone organic solvent developed chemically amplified resist
- Patent number 8,900,802
- Issue date Dec 2, 2014
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of directed self-assembly and layered structures formed the...
- Patent number 8,821,978
- Issue date Sep 2, 2014
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Silicon containing coating compositions and methods of use
- Patent number 8,802,347
- Issue date Aug 12, 2014
- International Business Machines Corporation
- Robert D. Allen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Functionalized carbosilane polymers and photoresist compositions co...
- Patent number 8,334,088
- Issue date Dec 18, 2012
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Bilayer systems including a polydimethylglutarimide-based bottom la...
- Patent number 8,323,868
- Issue date Dec 4, 2012
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low activation energy photoresist composition and process for its use
- Patent number 8,168,366
- Issue date May 1, 2012
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for using compositions containing fluorocarbinols in lithogr...
- Patent number 8,124,327
- Issue date Feb 28, 2012
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High contact angle topcoat material and use thereof in lithography...
- Patent number 8,034,532
- Issue date Oct 11, 2011
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low outgassing photoresist compositions
- Patent number 7,951,525
- Issue date May 31, 2011
- International Business Machines Corporation
- Richard A. DiPietro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Functionalized carbosilane polymers and photoresist compositions co...
- Patent number 7,883,828
- Issue date Feb 8, 2011
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Functionalized carbosilane polymers and photoresist compositions co...
- Patent number 7,824,845
- Issue date Nov 2, 2010
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning a low activation energy photoresist
- Patent number 7,820,369
- Issue date Oct 26, 2010
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for using compositions containing fluorocarbinols in lithogr...
- Patent number 7,781,157
- Issue date Aug 24, 2010
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low activation energy dissolution modification agents for photoresi...
- Patent number 7,759,044
- Issue date Jul 20, 2010
- International Business Machines Corporation
- Robert David Allen
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Low blur molecular resist
- Patent number 7,622,240
- Issue date Nov 24, 2009
- International Business Machines Corporation
- Ratnam Sooriyakumaran
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Low activation energy photoresist composition and process for its use
- Patent number 7,476,492
- Issue date Jan 13, 2009
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low activation energy dissolution modification agents for photoresi...
- Patent number 7,358,029
- Issue date Apr 15, 2008
- International Business Machines Corporation
- Robert David Allen
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
SELF-PRIMING RESIST FOR GENERIC INORGANIC HARDMASKS
- Publication number 20200050108
- Publication date Feb 13, 2020
- International Business Machines Corporation
- Chi-Chun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NITROGEN HETEROCYCLE-CONTAINING MONOLAYERS ON METAL OXIDES FOR BIND...
- Publication number 20190137879
- Publication date May 9, 2019
- International Business Machines Corporation
- Shu-Jen Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NON-IONIC LOW DIFFUSING PHOTO-ACID GENERATORS
- Publication number 20180044284
- Publication date Feb 15, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS
- Publication number 20180044459
- Publication date Feb 15, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-AC...
- Publication number 20180046077
- Publication date Feb 15, 2018
- International Business Machines Corporation
- Takehisa Ishimaru
- C07 - ORGANIC CHEMISTRY
Information Patent Application
BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS
- Publication number 20170114246
- Publication date Apr 27, 2017
- International Business Machines Corporation
- Noel Arellano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST PERFORMANCE FOR THE NEGATIVE TONE DEVELOP ORGANIC DEVELOPMEN...
- Publication number 20150309415
- Publication date Oct 29, 2015
- International Business Machines Corporation
- LUISA D. BOZANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST
- Publication number 20140242526
- Publication date Aug 28, 2014
- JSR Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Performance for the Negative Tone Develop Organic Developmen...
- Publication number 20140220495
- Publication date Aug 7, 2014
- International Business Machines Corporation
- Luisa D. Bozano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LIT...
- Publication number 20130260313
- Publication date Oct 3, 2013
- Central Glass Co., Ltd.
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...
- Publication number 20110147983
- Publication date Jun 23, 2011
- Joy CHENG
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LA...
- Publication number 20110111339
- Publication date May 12, 2011
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE
- Publication number 20110111345
- Publication date May 12, 2011
- International Business Machines Corporation
- Robert D. Allen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE
- Publication number 20110053083
- Publication date Mar 3, 2011
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Functionalized Carbosilane Polymers and Photoresist Compositions Co...
- Publication number 20110045407
- Publication date Feb 24, 2011
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Low Activation Energy Photoresist Composition and Process for Its Use
- Publication number 20110008727
- Publication date Jan 13, 2011
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for Using Compositions Containing Fluorocarbinols in Lithogr...
- Publication number 20100239985
- Publication date Sep 23, 2010
- International Business Machines Corporation
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW OUTGASSING PHOTORESIST COMPOSITIONS
- Publication number 20100062368
- Publication date Mar 11, 2010
- International Business Machines Corporation
- Richard A. DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CO...
- Publication number 20090081579
- Publication date Mar 26, 2009
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CO...
- Publication number 20090081597
- Publication date Mar 26, 2009
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CO...
- Publication number 20090081598
- Publication date Mar 26, 2009
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CO...
- Publication number 20090081585
- Publication date Mar 26, 2009
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY
- Publication number 20080193879
- Publication date Aug 14, 2008
- Robert Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESI...
- Publication number 20080153034
- Publication date Jun 26, 2008
- Robert David Allen
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Method for using compositions containing fluorocarbinols in lithogr...
- Publication number 20080026317
- Publication date Jan 31, 2008
- International Business Machines Co
- Gregory Breyta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low activation energy photoresist composition and process for its use
- Publication number 20070275324
- Publication date Nov 29, 2007
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY
- Publication number 20070254235
- Publication date Nov 1, 2007
- International Business Machines Corporation
- ROBERT DAVID ALLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH CONTACT ANGLE TOPCOAT MATERIAL AND USE THEREOF IN LITHOGRAPHY...
- Publication number 20070254236
- Publication date Nov 1, 2007
- International Business Machines Corporation
- ROBERT DAVID ALLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low activation energy dissolution modification agents for photoresi...
- Publication number 20070231734
- Publication date Oct 4, 2007
- Robert David Allen
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Low blur molecular resist
- Publication number 20060194144
- Publication date Aug 31, 2006
- Ratnam Sooriyakumaran
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hoa D. Truong

Person

Patents Grantslast 30 patents

Self-priming resist for generic inorganic hardmasks

Nitrogen heterocycle-containing monolayers on metal oxides for bind...

Fluorinated sulfonate esters of aryl ketones for non-ionic photo-ac...

Non-ionic aryl ketone based polymeric photo-acid generators

Non-ionic low diffusing photo-acid generators

Block copolymers for directed self-assembly applications

Photoacid generating polymers containing a urethane linkage for lit...

Wet strippable gap fill materials

Resist performance for the negative tone develop organic developmen...

Non-ionic photo-acid generating polymers for resist applications

Resist performance for the negative tone develop organic developmen...

Chemically amplified photoresist composition and process for its use

Self-topcoating resist for photolithography

Positive tone organic solvent developed chemically amplified resist

Methods of directed self-assembly and layered structures formed the...

Silicon containing coating compositions and methods of use

Functionalized carbosilane polymers and photoresist compositions co...

Bilayer systems including a polydimethylglutarimide-based bottom la...

Low activation energy photoresist composition and process for its use

Method for using compositions containing fluorocarbinols in lithogr...

High contact angle topcoat material and use thereof in lithography...

Low outgassing photoresist compositions

Functionalized carbosilane polymers and photoresist compositions co...

Functionalized carbosilane polymers and photoresist compositions co...

Method for patterning a low activation energy photoresist

Method for using compositions containing fluorocarbinols in lithogr...

Low activation energy dissolution modification agents for photoresi...

Low blur molecular resist

Low activation energy photoresist composition and process for its use

Low activation energy dissolution modification agents for photoresi...

Patents Applicationslast 30 patents

SELF-PRIMING RESIST FOR GENERIC INORGANIC HARDMASKS

NITROGEN HETEROCYCLE-CONTAINING MONOLAYERS ON METAL OXIDES FOR BIND...

NON-IONIC LOW DIFFUSING PHOTO-ACID GENERATORS

NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS

FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-AC...

BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS

RESIST PERFORMANCE FOR THE NEGATIVE TONE DEVELOP ORGANIC DEVELOPMEN...

POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST

Resist Performance for the Negative Tone Develop Organic Developmen...

PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LIT...

METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THE...

BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LA...

SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE

CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE

Functionalized Carbosilane Polymers and Photoresist Compositions Co...

Low Activation Energy Photoresist Composition and Process for Its Use

Method for Using Compositions Containing Fluorocarbinols in Lithogr...

LOW OUTGASSING PHOTORESIST COMPOSITIONS

FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CO...

FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CO...

FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CO...

FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CO...

SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY

LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESI...

Method for using compositions containing fluorocarbinols in lithogr...

Low activation energy photoresist composition and process for its use

SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY

HIGH CONTACT ANGLE TOPCOAT MATERIAL AND USE THEREOF IN LITHOGRAPHY...

Low activation energy dissolution modification agents for photoresi...

Low blur molecular resist